In
this paper, we report the growth of a high-quality 100 nm thick
InSb layer on a (001) GaAs substrate for InSb-based high-speed electronic
device applications. A continuously graded buffer (CGB) technique
with In
x
Al
1–
x
Sb was used to grow high-quality InSb films on GaAs substrates.
The CGB layer was grown by continuously changing the growth temperature
and composition of the aluminum and indium during the growth of the
buffer layer. Degradation of electrical properties, which normally
accompany carrier-defect scattering in a heteroepitaxial layer, was
minimized by using the CGB layer. The electrical properties of the
InSb films were characterized by Hall measurements, and the electron
mobility of the 100 nm-thick InSb film had the largest value, of 39 290
cm
2
/V·s, among reports of similar thickness. To investigate
the relationship between electrical and structural properties, the
100 nm thick InSb film was characterized by energy-dispersive spectroscopy
and transmission electron microscopy.