1994
DOI: 10.1109/23.340536
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Three-dimensional simulation of charge collection and multiple-bit upset in Si devices

Abstract: In this paper, three-dimensional numerical simulation is used to explore the basic charge-collection mechanisms in silicon n+/p diodes. For diodes on lightly4oped substrates ( Show more

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Cited by 107 publications
(46 citation statements)
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“…This pushes the electric field deep into the device, and a field-free region now exists near the top of the device where the induced carriers are located. This is exactly analogous to the phenomenon of "funneling" that occurs following a single ion strike, and that contributes to single-event upset in microelectronics [7,8]. In the present case, the TRM beam spot just looks like an ion strike with a very large lateral extent.…”
Section: Mark II Transient Radiation Microscope Resultssupporting
confidence: 60%
“…This pushes the electric field deep into the device, and a field-free region now exists near the top of the device where the induced carriers are located. This is exactly analogous to the phenomenon of "funneling" that occurs following a single ion strike, and that contributes to single-event upset in microelectronics [7,8]. In the present case, the TRM beam spot just looks like an ion strike with a very large lateral extent.…”
Section: Mark II Transient Radiation Microscope Resultssupporting
confidence: 60%
“…This charge can be collected at reverse-biased drain junctions via electrical drift and diffusion [16], [17]. The logic value stored in an SRAM cell will be lost if the circuit cannot dissipate the charge before feedback causes the cell to flip state [18].…”
Section: Single-event Upsets and Single-event Transientsmentioning
confidence: 99%
“…Charge-collection effects have been extensively studied both analytically [24], [25], [26], [27], [28] and using device simulators [29], [30], [31], e.g., DESSIS from ISE [32]. Identical tracks produced at different locations will have different effects on the circuit.…”
Section: Particle Tracks In Siliconmentioning
confidence: 99%