Ti-Si-N films prepared by magnetron sputtering

Li, Pan; Bai, Yang; Zhang, Dong; Wang, Jian

doi:10.1007/s12598-012-0488-5

Cited by 6 publications

(4 citation statements)

References 22 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Each such spike will behave as a small second-phase particle in an otherwise damaged matrix and interact with dislocations. The real scenario may be a mixture of both mechanism [38,39,[42][43][44][45].…”

Section: Ion Implantation Led To Decrease In Ti Concentration and Locmentioning

confidence: 99%

Effect of ion implantation on the physical and mechanical properties of Ti-Si-N multifunctional coatings for biomedical applications

et al. 2016

View full text Add to dashboard Cite

In the present work, multifunctional Ti-SiN coatings have been deposited using CAVD method with the aim of studying their chemical, physical, structural and mechanical properties. Coatings of Ti-SiN were modified by high-intensity ion implantation using copper ions with dose D = 2 × 10 17 ions/cm 2 and energy E = 60 keV. The results demonstrated that ion implantation has an effect on the grain size, hardness, and Young modulus of the Ti-SiN coating. Additionally, the effect of Cu implantation on the bioactive properties of coatings was investigated by contact antimicrobial essay. The results show a high release of Cu ions in the cultivation liquid and the low efficiency of the b20% Cu doping towards E. coli bacteria. Our results bring understanding to the low dosage ion implantation of multifunctional surfaces towards applications and general drawbacks of ion implantation as bioactive tailoring method.

show abstract

Section: Ion Implantation Led To Decrease In Ti Concentration and Locmentioning

confidence: 99%

Effect of ion implantation on the physical and mechanical properties of Ti-Si-N multifunctional coatings for biomedical applications

et al. 2016

View full text Add to dashboard Cite

show abstract

“…These results above show that the increase in N 2 flow rate is beneficial for the grain refinement of TiN in the nanocomposite film. This may be because increasing N 2 flow rate can result in more a-Si 3 N 4 formed [9], inhibiting the growth of TiN grains [5].…”

Section: Resultsmentioning

confidence: 99%

“…This is associated with the finer and smoother structure of the nanocomposite film produced at 15 sccm as shown in Fig.2b and Fig.3a. The excellent adhesion strength of such film may play a positive role in the cutting performance [9]. The film produced at N 2 flow rate of 20 sccm has the lowest adhesion strength, perhaps resulting from its most amorphous Si 3 N 4 and highest brittleness [7,9].…”

Section: Resultsmentioning

confidence: 99%

“…Zhou et al [7] reported Ti-Si-N nanocomposite film had a maximum hardness of 47 GPa. In reactive sputtering processes, the microstructure and properties of the Ti-Si-N nanocomposite films strongly depend on the processing parameters such as bias voltage, nitrogen partial pressure, substrate temperature and the content of silicon [7][8][9][10]. Because relative less information about effect of N 2 flow rate on adhesion strength and friction coefficient of Ti-Si-N nanocomposite films, in this paper Ti-Si-N nanocomposite films were prepared by co-sputtering Ti and Si targets in Ar/N 2 gas atmosphere, and the effect of N 2 flow rate on the microstructure, adhesion strength and friction coefficient of the deposited films was investigated in details.…”

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Effect of Nitrogen Flow Rate on Structure and Adhesion Strength of Magnetron Sputtered Ti-Si-N Nanocomposite Films

Xie

Zhu

et al. 2016

MATEC Web Conf.

View full text Add to dashboard Cite

Abstract. Ti-Si-N nanocomposite films were prepared by co-sputtering Ti and Si targets in Ar/N 2 gas atmosphere. The effect of N 2 flow rate on the structure, adhesion strength and friction coefficient of the deposited films was studied by using X-ray diffraction, atom force microscope, field emission scanning electron microscopy and multi-functional tester for material surface properties. The Ti-Si-N films had a fine, smooth and compact structure with TiN nanograins embedded in an amorphous Si 3 N 4 matrix. The nanocomposite films exhibited (200), (111), (220) and (222) reflections with a dominant orientation of the (200) reflection. When the N 2 flow rate increased, the film structure was refined. It was found that both interfacial adhesion strength and friction coefficient depended on the N 2 flow rate, and the best values were exhibited by the nanocomposite film produced at N 2 flow rate of 15 sccm, perhaps contributed to a finer and smoother structure of this deposited film.

show abstract

Recent developments in magnetron-sputtered silicon nitride coatings of improved mechanical and tribological properties for extreme situations

et al. 2023

View full text Add to dashboard Cite

Ti-Si-N films prepared by magnetron sputtering

Cited by 6 publications

References 22 publications

Effect of ion implantation on the physical and mechanical properties of Ti-Si-N multifunctional coatings for biomedical applications

Effect of ion implantation on the physical and mechanical properties of Ti-Si-N multifunctional coatings for biomedical applications

Effect of Nitrogen Flow Rate on Structure and Adhesion Strength of Magnetron Sputtered Ti-Si-N Nanocomposite Films

Recent developments in magnetron-sputtered silicon nitride coatings of improved mechanical and tribological properties for extreme situations

Contact Info

Product

Resources

About