TiAlN coatings deposited by triode magnetron sputtering varying the bias voltage

Devia, D M; Restrepo-Parra, E.; Arango, P.J.; Tschiptschin, André Paulo; Vélez, Juan Manuel

doi:10.1016/j.apsusc.2011.02.027

Cited by 98 publications

(40 citation statements)

References 45 publications

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“…Based on the regression analysis, the TiAlN coating hardness as a function of the substrate bias and the nitrogen flow rate can be predicted using Equation (1 …”

Section: Resultsmentioning

confidence: 99%

The Mechanical and Tribology Properties of Sputtered Titanium Aluminum Nitride Coating on the Tungsten Carbide Insert Tool in the Dry Turning of Tool Steel

Budi¹,

Muhamad²,

Rahman³

2015

MST

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The effect of the sputtering parameters on the mechanical tribology properties of Titanium Aluminum Nitride coating on the tungsten cabide insert tool in the dry turning of tool steel has been investigated. The coating was deposited using a Direct Current magnetron sputtering system with various substrate biases (-79 to -221 V) and nitrogen flow rates (30 to 72 sccm). The dry turning test was carried out on a Computer Numeric Code machine using an optimum cutting parameter setting. The results show that the lowest flank wear (~0.4 mm) was achieved using a Titanium Aluminum Nitride-coated tool that was deposited at a high substrate bias (-200 V) and a high nitrogen flow rate (70 sccm). The lowest flank wear was attributed to high coating hardness. AbstrakSifat Mekanik dan Tribologi Lapisan Titanium Aluminium Nitrida pada Perkakas Tungsten Karbida dalam Pemotongan Kering Baja. Telah dilakukan penelitian mengenai pengaruh parameter sputering terhadap sifat mekanik dan tribologi lapisan Titanium Aluminum Nitrida pada perkakas potong tungsten karbida dalam proses pemotongan turning kering baja perkakas. Deposisi lapisan tipis dilakukan menggunakan sistem sputtering magnetron dengan variasi tegangan substrate (-79 s/d -221 Volt) dan laju alir gas nitrogen (30 s/d 72 sccm). Pemotongan turning kering dilakukan menggunakan mesin bubut otomatis CNC dengan parameter pemotongan optimum. Hasil percobaan menunjukan bahwa aus sisi terendah (~0.4 mm) perkakas ditunjukan oleh lapisan Titanium Aluminum Nitrida yang dideposisikan pada tegangan substrat (-200 V) dan laju alir gas nitrogen (70 sccm) tinggi. Rendahnya aus sisi perkakas diakibatkan oleh tingginya nilai kekerasan lapisan.

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“…Based on the regression analysis, the TiAlN coating hardness as a function of the substrate bias and the nitrogen flow rate can be predicted using Equation (1 …”

Section: Resultsmentioning

confidence: 99%

The Mechanical and Tribology Properties of Sputtered Titanium Aluminum Nitride Coating on the Tungsten Carbide Insert Tool in the Dry Turning of Tool Steel

Budi¹,

Muhamad²,

Rahman³

2015

MST

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“…TiAlN coatings were deposited on AISI O1 tool steel substrates using a target of Ti 0.5 Al 0.5 by triode magnetron sputtering (TMS) technique in a non-commercial system [22], [23] . A continuous gas flow of argon and nitrogen (Ar+N 2 ) were injected into the chamber for the coatings production.…”

Section: Methodsmentioning

confidence: 99%

“…If the energy level of the ions bombarding the surface is increased, it can generate surface atom desorption. This phenomenon produces surface porosities and defects [23]. The second factor is the increase in the collisions that, depending on to the elemental ionization degree, can cause energy loss allowing the production of neutral particles, making the magnetic field does not affect their movement.…”

mentioning

confidence: 99%

Structural and Morphological Properties of Titanium Aluminum Nitride Coatings Produced by Triode Magnetron Sputtering

Devia

Vélez-Restrepo

2014

ing.cienc.

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TixAl1−xN coatings were grown using the triode magnetron sputtering technique varying the bias voltage between -40 V and -150V. The influence of bias voltage on structural and morphological properties was analyzed by means of energy dispersive spectroscopy, x-ray diffraction and atomic force microscopy techniques. As the bias voltage increased, an increase in the Al atomic percentage was observed competing with Ti and producing structural changes. At low Al concentrations, the film presented a FCC crystalline structure; nevertheless, as Al was increased, the structure presented a mix of FCC and HCP phases. On the other hand, an increase in bias voltage produced a decrease films thickness due to an increase in collisions. Moreover, the grain size and roughness were also strongly influenced by bias voltage. Propiedades morfológicas y estructurales de recubrimientos nitruro de titanio aluminio producidos por magnetron sputtering tríodo Resumen Se crecieron recubrimientos de TixAl1−xN empleando la técnica de magnetron sputtering tríodo, variando el voltaje de polarización entre -40 V y -150V. Por medio de espectroscopía de energía dispersiva, difracción de rayos x y miscroscopía de fuerza atómica, se analizó la influencia del voltaje de polarización sobre las propiedades morfológicas y estructurales de los recubrimientos. A medida que el voltaje bias se incrementó, se observó un aumento en el porcentaje atómico de Al, compitiendo con la concentración de Ti y produciendo cambios estructurales. A bajas concentraciones de Al, la pelćula exhibió una estructura cristalina FCC; sin embargo, a medida que le porcentaje de Al disminuyó, se pudo detectar una mezcla de fases FCC y HCP. Por otro lado, el incremento en el voltaje de polarización produjo una disminución en el espesor de las películas, debido al aumento en el número de colisiones. Además, el tamaño de grano y la rugosidad se vieron fuertemente afectados por el voltaje bías.Palabras clave: TiAlN; voltaje de polarización; sputtering; procentaje atómico; XRD.

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“…Additionally, increases in the roughness and grain size were observed with increasing bias because of the increase in the ion flux/energy that was bombarding the surface. Moreover, a decrease in the hardness and the adherence was observed when the bias voltage was increased because of the decrease in the film density [17]. Although there are many works that present the growth of TiAlN coatings, using several techniques and which study the influence of the deposition parameters, including the bias voltage, the TMS technique has not been commonly used.…”

Section: Introductionmentioning

confidence: 99%

Bias voltage influence on the mechanical and tribological properties of titaniumaluminum nitride coatings produced by triode magnetron sputtering

Narvaez

Restrepo

2015

Matéria (Rio J.)

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Ti x Al 1-x N coatings were grown using the triode magnetron sputtering technique with various bias voltages between -40 V and -150 V. As the bias voltage increased, an increase in the Al atomic percentage was observed, presenting a competition with Ti and producing structural changes. Moreover, the grain size and roughness were also strongly influenced by the bias voltage. It was observed that coatings with concentrations of approximately 25% Al and 75% Ti exhibited an optimum mixture of mechanical and tribological properties. The average coefficient of friction was low for the TiAlN coating that was grown at -40 V. Additionally, the critical load was obtained by measuring the adhesion using the scratch test.

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TiAlN coatings deposited by triode magnetron sputtering varying the bias voltage

Cited by 98 publications

References 45 publications

The Mechanical and Tribology Properties of Sputtered Titanium Aluminum Nitride Coating on the Tungsten Carbide Insert Tool in the Dry Turning of Tool Steel

The Mechanical and Tribology Properties of Sputtered Titanium Aluminum Nitride Coating on the Tungsten Carbide Insert Tool in the Dry Turning of Tool Steel

Structural and Morphological Properties of Titanium Aluminum Nitride Coatings Produced by Triode Magnetron Sputtering

Bias voltage influence on the mechanical and tribological properties of titaniumaluminum nitride coatings produced by triode magnetron sputtering

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