Titanium dioxide thin films deposition by direct current hollow cathode magnetron sputtering

Duarte, Diego Alexandre; Massi, M.; Sobrinho, Argemiro Soares da Silva; Maciel, Homero Santiago; Grigorov, K. G.; Fontana, L.C.

doi:10.1051/epjap/2009179

Cited by 12 publications

(5 citation statements)

References 8 publications

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“…In addition, at lower oxygen concentrations the plasma sheath in front of the film supports higher potential drop thus more energetic bombardment is promoted by Ar ion flux. This ion impact may cause formation of films with higher roughness, lattice defects and large amount of peaks and valleys 12,13 where all these effects play an important role to increase the bond strength between Y-TZP and resin cement. On the other hand, as the surface modification by ion bombardment in reactive magnetron sputtering discharges is about of few nanometers 13 , it was not possible to observe significant modifications on the films surface by images of optical profilometry in Figure 6.…”

Section: Shear Testing Optical Microscopy and Scanning Electron Micrmentioning

confidence: 99%

Deposition of SiOx thin films on Y-TZP by reactive magnetron sputtering: influence of plasma parameters on the adhesion properties between Y-TZP and resin cement for application in dental prosthesis

et al. 2011

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In this paper SiO x thin films were deposited on Y-TZP ceramics by reactive magnetron sputtering technique in order to improve the adhesion properties between Y-TZP and resin cement for applications in dental prosthesis. For fixed cathode voltage, target current, working pressure and target-to-substrate distance, SiO x thin films were deposited at different oxygen concentrations in the Ar+O 2 plasma forming gas. After deposition processes, SiO x thin films were characterized by profilometry, energy dispersive spectroscopy (EDS), optical microscopy and scanning electron microscopy (SEM). Adhesion properties between Y-TZP and resin cement were evaluated by shear testing. Results indicate that films deposited at 20%O 2 increased the bond strength to (32.8 ± 5.4) MPa. This value has not been achieved by traditional methods.

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Section: Shear Testing Optical Microscopy and Scanning Electron Micrmentioning

confidence: 99%

Deposition of SiOx thin films on Y-TZP by reactive magnetron sputtering: influence of plasma parameters on the adhesion properties between Y-TZP and resin cement for application in dental prosthesis

et al. 2011

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“…Paul et al used this ratio to study hydrophobicity of diamond like carbon films and interpreted results in terms of hybridization [17]. Recently CHC magnetron sputtering system was used by Duarte et al to deposit crystalline titanium dioxide thin film on p-silicon substrate [18]. 4…”

Section: Introductionmentioning

confidence: 99%

Amorphous carbon films in direct current magnetron sputtering from regenerative sooting discharge

Javeed

Yamin

Janjua

et al. 2011

Vacuum

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We present results of carbon coatings on metal substrates in cylindrical hollow cathode (CHC) direct current magnetron sputtering. This is a new technique of making amorphous carbon film in CHC magnetron sputtering from regenerative sooting discharge. The carbon films are deposited on Cu and Al substrates in Ne atmosphere and compared with the films of carbon soot on the same materials produced from conventional arc discharge between graphite electrodes at 80 A in He background. The films are characterized using online emission, Raman, and Fourier transform infrared spectroscopy; X-ray diffraction (XRD) and Scanning electron microscopy (SEM). Raman spectroscopy reveals the existence of graphite and diamond like structures from arc discharge while in CHC magnetron sputtering, graphite like structures are dominant. XRD pattern from arc discharge show precipitates of Al 4 C 3 of rhombohedral and hexagonal types in nanometer ranges for aluminum sample and probable formation of diamond and hexagonal carbon in copper whilst in magnetron sputtering we get amorphous carbon films. SEM images of surface show collection of loose agglomerates of carbon particles in arc discharge whereas for magnetron sputtering structures are regular with smooth edges and fine grains.

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“…The described IM configuration uses the principle of sputtering, which was described by Thornton in 1977 [ 12 ]. The main difference of the IM prototype used in this work with respect to the standard IM deposition process was the positive potential connection to the sample holder (see Figure 1 ), instead of the more common negative cathode connection [ 14 ]. This aspect might have some beneficial effects on the deposition process and deposit growth.…”

Section: Discussionmentioning

confidence: 99%

“…There were no examples of inverted or cylindrical source utilisation found in the literature. However, in the case of

sputtering, one work reports a similar inverted magnetron approach [ 14 ]. Duarte et al, in their work, use an IM source with permanent magnets and a sample holder that can change its position inside the hollow cathode.…”

Section: Discussionmentioning

confidence: 99%

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First Results on Zinc Oxide Thick Film Deposition by Inverted Magnetron Sputtering for Cyclotron Solid Targets Production

et al. 2023

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The magnetron sputtering technique has been investigated in recent years with ever-growing interest as a verifiable solid target manufacturing technology aimed at the production of medical radionuclides by using low-energy cyclotron accelerators. However, the possible loss of high-cost materials prevents access to work with isotopically enriched metals. The need for expensive materials for the supply of the growing demand for theranostic radionuclides makes the material-saving approach and recovery essential for the radiopharmaceutical field. To overcome the main magnetron sputtering drawback, an alternative configuration is proposed. In this work, an inverted magnetron prototype for the deposition of tens of μm film onto different substrates is developed. Such configuration for solid target manufacturing has been proposed for the first time. Two ZnO depositions (20–30 μm) onto Nb backing were carried out and analysed by SEM (Scanning Electron Microscopy) and XRD (X-ray Diffractogram). Their thermomechanical stability under the proton beam of a medical cyclotron was tested as well. A possible improvement of the prototype and the perspective of its utilisation were discussed.

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Titanium dioxide thin films deposition by direct current hollow cathode magnetron sputtering

Cited by 12 publications

References 8 publications

Deposition of SiOx thin films on Y-TZP by reactive magnetron sputtering: influence of plasma parameters on the adhesion properties between Y-TZP and resin cement for application in dental prosthesis

Deposition of SiOx thin films on Y-TZP by reactive magnetron sputtering: influence of plasma parameters on the adhesion properties between Y-TZP and resin cement for application in dental prosthesis

Amorphous carbon films in direct current magnetron sputtering from regenerative sooting discharge

First Results on Zinc Oxide Thick Film Deposition by Inverted Magnetron Sputtering for Cyclotron Solid Targets Production

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