TOF MS Investigation of Nickel Oxide CVD

Abstract

NiO layers were deposited by metal-organic chemical vapor deposition using bis-(ethylcyclopentadienyl) nickel (EtCp)Ni and oxygen or ozone. As a continuation of kinetic study of NiO MOCVD the gas-phase, transformations of (EtCp)Ni were studied in the temperature range of 380-830 K. Time of reactions corresponding to the residence time of the gas stream in hot zone of the reactor was about 0.1 s under conditions studied. The interaction of (EtCp)Ni with oxygen started at 450 K and its conversion rate reached the maximum at 700 K. The interaction of (EtCp)Ni with ozone started at 400 K and its conversion rate reached the maximum at 600 K. Transformations of the gas phase with the temperature in the reaction zone were studied, the model reaction schemes illustrating (EtCp)Ni transformations in the reaction systems containing oxygen and ozone have developed. In the reaction system (EtCp)Ni-O-Ar the main gas-phase products at 380-500 K were CO, CO, HCO, CHOH, CpCOOH, and CpO. Formation of the CHO, CHO, and CHO was found at 630-830 K. The same gas-phase species, (CHO)Ni and dialdehydes was formed in the reaction system (EtCp)Ni-O-O-Ar. Graphical Abstract ᅟ.

Laser-Induced Mesoporous Nickel Oxide as a Highly Sensitive Nonenzymatic Glucose Sensor

“…While recent advancements in printed electronics and additive manufacturing technologies have provided a new paradigm in scalable manufacturing of many of such glucose sensors, the desired functional material for printing still needs to be prepared in the form of inks and pastes made of suspended nano- and microparticles. The synthesis of these materials often relies on time-consuming chemical synthesis processes including solvothermal/hydrothermal processes, , sol–gel, chemical bath deposition, chemical and physical , vapor deposition, electrochemical deposition, microwave-assisted approaches, and electrospinning . Apart from material synthesis challenges, glucose sensors often require printing of multilayers which faces different technical manufacturing challenges, including the need of multiple curing/drying steps between each printed layers and also the high risk of ineffective contact/bonding between printed layers …”

Nickel oxide thin films grown by chemical deposition techniques: Potential and challenges in next‐generation rigid and flexible device applications

“…These Ni‐rich films also showed resistive switching behavior, though the initial resistivity values were not reported. Kondrateva et al showed excess oxygen in their NiO x films deposited using ethylcyclopentadienyl nickel (Ni[EtCp] 2 ) and O 2 + O 3 , with Ni/O ratio of 0.85, 61 but no electrical properties were reported.…”

Fabrication of Li-Doped NiO Thin Films by Ultrasonic Spray Pyrolysis and Its Application in Light-Emitting Diodes

“…NiO x thin films have also been successfully applied as hole transporting layers (HTLs) in organic and perovskite solar cells [ 6 , 7 , 8 , 9 , 10 ], and in inorganic and perovskite light-emitting diodes (LEDs) [ 11 , 12 , 13 , 14 , 15 , 16 , 17 , 18 ]. Various methods can be used to prepare NiO thin films, such as RF and DC magnetron sputtering [ 4 , 19 , 20 ], electron-beam evaporation [ 21 ], pulsed laser deposition [ 22 , 23 ], atomic layer deposition [ 24 ], metal-organic chemical vapor deposition [ 25 ], chemical bath deposition [ 26 ], spin coating [ 27 ], sol-gel process [ 28 ], SILAR [ 29 ], and Spray Pyrolysis (SP) [ 30 , 31 ]. Among all these methods, the SP technique has the advantage of being easy and economical because it does not need high vacuum equipment and offers the possibility for large area deposition.…”