Toward Functionalized Surfaces through Surface Esterification of Silica

Abstract

Three aspects of the esterification reaction of silica surfaces with alcohols that are relevant for the synthesis of functional materials have been studied: surface coverage, hydrolytic stability, and the introduction of functional groups. The chemisorption of alcohols on silica can be described by the Langmuir adsorption model, which allows precise control of the surface coverage. It was shown that the hydrolytic stability of the materials obtained could be significantly improved by reacting the esterified silica with hexamethyldisilazane. The use of alcohols containing mercapto groups gave silica with surface-tethered mercapto groups. These groups are available for further chemical reactions, but the hydrolytic stability of the functional material decreases in comparison to silica esterified with the corresponding nonfunctional alcohol.

Effect of alcohol–water exchange and surface scanning on nanobubbles and the attraction between hydrophobic surfaces

“…Silicon wafer surfaces terminated with silicon oxide (Silicon Valley Microelectronics, USA) were used to produce flat hydrophobic surfaces by esterification [40][41][42][43] with 1-octanol (Merck, Australia). Silica substrates were first cleaned ultrasonically (10 min in each acetone, ethanol and water), then soaked for 15 min in a 5H 2 O:1NH 4 OH:1H 2 O 2 solution (RCA-SC1) at 75 • C and washed with copious amounts of water and then dried under a nitrogen stream [44,45].…”

Systematically altering the hydrophobic nanobubble bridging capillary force from attractive to repulsive

“…Silicon wafer surfaces terminated with silicon oxide (Silicon Valley Microelectronics, USA) were used to produce flat hydrophobic surfaces by esterification [46][47][48][49] with 1-octanol (Merck, Australia). Silica substrates were first cleaned ultrasonically (10 min in each acetone, ethanol and water), then soaked for 15 min in a 5H 2 O:1NH 4 OH:1H 2 O 2 solution (RCA-SC1) at 75 • C and washed with copious amounts of water and then dried under a nitrogen stream [50,51].…”

Effect of nanobubbles on friction forces between hydrophobic surfaces in water

“…Silicon wafer surfaces terminated with silicon oxide (Silicon Valley Microelectronics, USA) were used to produce flat hydrophobic surfaces by esterification [39][40][41][42] with 1-octanol (Merck, Australia). Silica substrates were first cleaned ultrasonically (10 min each in acetone, ethanol, and water), then soaked for 15 min in a 5H 2 O:1NH 4 OH:1H 2 O 2 solution (RCA-SC1) at 75 • C and washed with copious amounts of water, and then dried under a nitrogen stream [43,44].…”