“…To verify this theoretical prediction and realize device applications, it is important that we fabricate high-quality QWRs with atomically flat interfaces. By using a combination of atomic hydrogen and a dimer arsenic source, we have recently demonstrated the selective growth of trench-type InGaAs/InAlAs QWR on a ( hydrogen-assisted molecular beam epitaxy (H-MBE) [2]. We have also demonstrated the clear negative differential resistance (NDR) of a trenchtype QWR-FET at low temperature [3,4].…”