Two dimensional photonic band gap pattering in thin chalcogenide glassy films

Feigel, Alexander; Veinger, M.; Sfez, B.; Arsh, A.; Klebanov, M.; Lyubin, V.

doi:10.1016/j.tsf.2005.04.082

Cited by 8 publications

(4 citation statements)

References 19 publications

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“…Challenges to fabricating ChG photonic crystals have been reported with various ChGs and fabrication process, such as the combination of Ge 33 As 12 Se 55 with focused ion beam milling [31], that with e-beam lithography and chemically assisted ion beam etching [32], As 2 S 3 with holographic lithography and wet etching [33], and As 2 S 3 and Ge 20 As 20 Se 14 Te 46 with direct laser writing [34,35]. In general, however, it is not straightforward to form waveguide facets and vertical airholes of photonic crystals because of the softness of ChGs, which makes optical characterizations challenging.…”

Section: Introductionmentioning

confidence: 99%

Nonlinear light propagation in chalcogenide photonic crystal slow light waveguides

Suzuki¹,

Baba²

2010

Opt. Express

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Optical nonlinearity can be enhanced by the combination of highly nonlinear chalcogenide glass and photonic crystal waveguides (PCWs) providing strong optical confinement and slow-light effects. In a Ag-As(2)Se(3) chalcogenide PCW, the effective nonlinear parameter γeff reaches 6.3 × 10(4) W(-1)m(-1), which is 200 times larger than that in Si photonic wire waveguides. In this paper, we report the detailed design, fabrication process, and the linear and nonlinear characteristics of this waveguide at silica fiber communication wavelengths. We show that the waveguide exhibits negligible two-photon absorption, and also high-efficiency self-phase modulation and four-wave mixing, which are assisted by low-dispersion slow light.

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Section: Introductionmentioning

confidence: 99%

Nonlinear light propagation in chalcogenide photonic crystal slow light waveguides

Suzuki¹,

Baba²

2010

Opt. Express

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“…[59], a new method of two-dimensional PC planar devices fabrication was proposed. The main idea of that method is the separation of the process into two steps, each one with its specific advantages.…”

Section: Application Of Chgp For Fabrication Of Photonic Crystalsmentioning

confidence: 99%

Chalcogenide glassy photoresists: History of development, properties, and applications

Lyubin

2009

Physica Status Solidi (b)

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The history of the development of photoresists based on the photostructural transformations in chalcogenide glassy semiconductors is discussed in this paper. The properties of such photoresists including the possibility of an essential increase of their photosensitivity and also applications are examined. Together with the photoresists, the chalcogenide glassy roentgen-, electron beam-, and plasma-resists are briefly considered.

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“…Chalcogenide glasses are Table 1 Average and ''partial'' selective dissolution contrast values for the films irradiated with a beam of Ar þ -laser (488 nm) Film composition c a c 1 c 2 c 3 c 4 c 5 c 6 As 2 S 3 40 30 35 50 40 30 30 10As 2 S 3 AEAs 2 Se 3 70 60 75 75 70 60 50 5As 2 S 3 AEAs 2 Se 3 90 65 150 140 110 90 70 3As 2 S 3 AEAs 2 Se 3 50 40 80 60 ---2As characterized by the highest refractive index among known photosensitive substances, which makes them desirable materials for use in photonic crystals and other electro-optical components. Examples of three-dimensional [11] and two-dimensional [9] photonic crystals, made using mAs 2 S 3 AEnAs 2 Se 3 ChP, are shown in Figs. 4 and 5.…”

Section: And Inmentioning

confidence: 99%

“…Additionally, the ChP possess a very high refractive index, ranging from 2.3 to 3.5, they are stable, do not need in any thermal treatment and are transparent in the infrared from 600 nm up to 12-15 lm. These properties allowed to apply ChP for fabrication of efficient diffraction gratings [4,5], IR microlens arrays and microlenses for optical fibers [6][7][8], two-dimensional and three-dimensional photonic band-gap crystals [9][10][11]. In some of these cases, an interference laser lithography was applied, and we can assume that this kind of photolithography using the most popular Ar þ -, He-Ne-and Nd:YAG-lasers will be often used in the near future.…”

Section: Introductionmentioning

confidence: 99%