2005
DOI: 10.1016/j.tsf.2004.11.076
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Two-stage growth of smooth Cu(In,Ga)Se2 films using end-point detection

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Cited by 18 publications
(10 citation statements)
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“…A void or an empty crevice is left behind. An analogous void formation mechanism was assumed by Schöldström et al for the CURO process [28] (Cu-rich first stage followed by a Cu-poor stage) and by Kessler et al [13] for the CUPRO process (similar to the three-stage used for our samples). Our findings provide evidence for the hypothesis of Kessler et al [13] that Cu-Se phases segregate at crevices between GBs, and voids form by out-diffusion of Cu during the final deposition stage.…”
Section: Discussionsupporting
confidence: 67%
“…A void or an empty crevice is left behind. An analogous void formation mechanism was assumed by Schöldström et al for the CURO process [28] (Cu-rich first stage followed by a Cu-poor stage) and by Kessler et al [13] for the CUPRO process (similar to the three-stage used for our samples). Our findings provide evidence for the hypothesis of Kessler et al [13] that Cu-Se phases segregate at crevices between GBs, and voids form by out-diffusion of Cu during the final deposition stage.…”
Section: Discussionsupporting
confidence: 67%
“…Another characteristic of our recipe is the relatively long third stage. This allows for a larger process window in our rate-controlled system, which does not use end-point detection [12]. The substrate was kept at a temperature of 300…”
Section: Cigs Recipe Specificsmentioning
confidence: 99%
“…Figure 6 presents a schematic of the effects of copper-indium back-end layers during post-selenization. According to the previous researches [32,33], the formation of various intermediates such as indium selenide and copper selenide as fluxing agents induced the internal diffusion of atoms to promote grain growth in the CIGS films during selenization reaction. The interaction phenomenon resulted in the diffusion of indium atoms toward the surface of CIGS films gradually, and gallium atoms accumulated in the bottom region of the CIGS films, as shown in figure 6(a).…”
Section: 2mentioning
confidence: 99%