2013 IEEE International Electron Devices Meeting 2013
DOI: 10.1109/iedm.2013.6724600
|View full text |Cite
|
Sign up to set email alerts
|

Ultra high density 3D via RRAM in pure 28nm CMOS process

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

0
25
0

Year Published

2014
2014
2022
2022

Publication Types

Select...
5
2
1

Relationship

1
7

Authors

Journals

citations
Cited by 53 publications
(25 citation statements)
references
References 9 publications
0
25
0
Order By: Relevance
“…This has been demonstrated with Ag-doped methyl-silsesquioxane (MSQ)-based bipolar CBRAM cells [190] and PI:PCBMbased unipolar organic resistive switching cells [191]. Recently, a modified version of 3-D cross-point via structure has been demonstrated for both unipolar TaON and bipolar TiON RRAM devices with standard CMOS processes [192]. Fig.…”
Section: Three-dimensional Integrationmentioning
confidence: 97%
See 1 more Smart Citation
“…This has been demonstrated with Ag-doped methyl-silsesquioxane (MSQ)-based bipolar CBRAM cells [190] and PI:PCBMbased unipolar organic resistive switching cells [191]. Recently, a modified version of 3-D cross-point via structure has been demonstrated for both unipolar TaON and bipolar TiON RRAM devices with standard CMOS processes [192]. Fig.…”
Section: Three-dimensional Integrationmentioning
confidence: 97%
“…(d) TEM image showing 1D1R integration of the TaON RRAM with TaO x -based diode. Reprinted with permission from[192]. Copyright (2013) IEEE.…”
mentioning
confidence: 95%
“…The former approach has been actively developed by industry researchers . Hsieh et al presented a high‐density 3D RRAM by embedding a TaON‐based RRAM cell in the via structure with 28 nm CMOS BEOL process . Liu et al presented a stacked 2‐layer 32‐Gb 3D RRAM test chip with a cross‐point structure in the 24 nm process .…”
Section: High‐speed and Scalable Rram Cells And Systemsmentioning
confidence: 99%
“…This device is fully integrated with standard CMOS processing. Resistance-state switching in unipolar memristive devices [37], [41], [42], [51], [52] is achieved by providing the same voltage polarities but different amplitudes across the two terminals of the memristive device for SET and RESET operations.…”
Section: A Envm Cells Using Memristive Devicesmentioning
confidence: 99%