“…The precursor solution was prepared by dissolving 0.5 g organometallic precursor powder Co (III) acetylacetonate (98.5%, Sigma-Aldrich, St. Louis, MO, USA) in 20 mL acetone (99.5%, Sigma-Aldrich, St. Louis, MO, USA) and placed in an ultrasonication system for 20 min. Thin-film deposition was accomplished by spray-coating, which we reported in our past work [ 16 , 17 ], the precursor solution on 1 cm × 1 cm Pt-coated silicon wafer (University Wafer, Boston, MA, USA) using an air-spray (Paasche Airbrush, Chicago, IL, USA) in ambient conditions. To ensure uniformity of the films, parameters such as the gas flow, precursor solution concentration, distance between the tip of the spray nozzle and the substrate, etc.…”