Ultrafine ZnO Nanowire Electronic Device Arrays Fabricated by Selective Metal–Organic Chemical Vapor Deposition

Abstract

Fine art: Ultrafine ZnO nanowires selectively grown parallel to the substrate only on Au patterns allow the integration of large numbers of nanowire field‐effect transistor arrays (see picture).

Procedures and Properties for a Direct Nano-Micro Integration of Metal and Semiconductor Nanowires on Si Chips

“…Various fabrication schemes exist to integrate 1D nanowires in Si-structures, for example, to utilize the large surface to volume ratio for a sensor, see [25][26][27]. All those fabrication schemes grow micro-or nanowires from one contact side to another side by utilizing several lithography steps.…”

“…All those fabrication schemes grow micro-or nanowires from one contact side to another side by utilizing several lithography steps. Furthermore, all approaches contain a certain statistics about how many bridges form between the contacts; see, for example, [27]. To simplify all those approaches to form a connection between two sides, we carry out growth from both contact sides in parallel and utilize those wires which interpenetrate in between the contacts.…”

Substrate dependent growth modes of ZnO nanorods grown by metalorganic chemical vapor deposition

“…In recent years, arrays of vertically aligned ZnO nanorods or nanowires were successfully grown on some substrates, such as Al 2 O 3 (0001) and Si, using the solution route [18,19], plasma-enhanced chemical vapor deposition [20,21], pulsed laser deposition [22,23], and metalorganic chemical vapor deposition (MOCVD) [3,4,14,24,25]. In addition, electroluminescence was observed in n-ZnO nanorod arrays vertically grown on a p-GaN wafer [26,27].…”

“…Many efforts have been made on the synthesis of one-dimensional (1D) ZnO nanomaterials, such as nanorods [4][5][6], nanotubes [7][8][9][10], nanowires [11][12][13][14][15], and nanoribbons [16,17]. In recent years, arrays of vertically aligned ZnO nanorods or nanowires were successfully grown on some substrates, such as Al 2 O 3 (0001) and Si, using the solution route [18,19], plasma-enhanced chemical vapor deposition [20,21], pulsed laser deposition [22,23], and metalorganic chemical vapor deposition (MOCVD) [3,4,14,24,25].…”

Assembly of Nanoparticles: Towards Multiscale Three-Dimensional Architecturing

“…Along with these advances, deposition of nanoparticles or molecules on desired position of a substrate with nanoscale resolution has received great attention in recent years, due to its promising potential to realize nanodevices for various applications in the fields of electronics, optics, chemistry, and biomedics [17][18][19][20][21][22][23][24][25][26][27][28] . The realization of emerging convergence technology requires us to have control capability on multiscale phenomena including nano, micro, and macro scales.…”