“…Several different approaches have been investigated for achieving RF SMFs with high UMA, such as oblique sputtering, facing target sputtering, exchange coupling, magnetoelectric coupling, etc. Oblique sputtering, [8][9][10] and facing target sputtering 11 can generate magnetic films with high UMA field values of up to 200-300 Oe, however, these magnetic films suffer from a very non-uniform thick-ness particularly across a large wafer size, which severely limits their practical applications. Exchange coupling is another method to achieve enhanced UMA fields, such as anitiferromagnetic (AFM)/ ferromagnetic (FM) exchange coupling, 5 12 13 and FM coupling between magnetically soft and hard layers.…”