Ultrahigh particle density seeding with nanocrystal diamond particles

Makita, H.; Nishimura, K.; Jiang, Nan; Hatta, Akimitsu; Ito, Toshimichi; Hiraki, Akio

doi:10.1016/0040-6090(96)08652-x

Cited by 46 publications

(13 citation statements)

References 5 publications

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“…In order to roughness of diamond films to be smaller than the wavelength of visible light the nucleation density should be at least 10 10 cm -2 . Among pretreatment techniques, scratching of substrates with diamond powder or paste 5 , biasing enhanced nucleation (BEN) 3 , ultrasonic agitation in a diamond slurry 2,6 and nanodiamond seeding 7,8 are the most widespread.…”

Section: Introductionmentioning

confidence: 99%

Optical properties of diamond films grown by MPCVD method with alternating nanodiamond injection

et al. 2005

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Transparent polycrystalline diamond films with grain size ranging from a few tens to hundreds of nanometres were prepared on fused silica substrate by Microwave Chemical Plasma Vapour Deposition method (MPCVD). The new technique, called alternating nanodiamonds injection, was applied for substrate pretreatment. It was demonstrated that nanodiamonds injected on fused silica substrate serve as nucleation centres and make possible an increase in nucleation density to 10 10 cm -2 . The influence of MPCVD parameters such as methane concentration, total pressure and substrate temperature on the crystalline structure and optical properties of diamond films were investigated by using microRaman spectroscopy and scanning electron microscopy, transmittance and reflectance measurements in the wavelength range of 400-1000 nm. Under appropriate MPCVD parameters, diamond films with optical transmission ~70% from 650 to 1000 nm and high content of diamond phase were fabricated.

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Section: Introductionmentioning

confidence: 99%

Optical properties of diamond films grown by MPCVD method with alternating nanodiamond injection

et al. 2005

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“…Diamond nanoparticle seeding [1][2][3] is the most commonly used technique today, as it leads to the highest nucleation density (>10 11 cm…”

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confidence: 99%

Electrical probing of B‐doped diamond seeds embedded into the interfacial layer of a conductive diamond film

Tsigkourakos

Hantschel

Bangerter³

et al. 2014

Physica Status Solidi (a)

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Phone: þ32 16 28 78 85, Fax: þ32 16 28 85 00As undoped diamond seed nanoparticles remain non-conductive after the growth of B-doped diamond films, they represent localized regions of low conductivity and basically form a resistive barrier at the diamond film-substrate interface. This can be detrimental for diamond applications that require a good electrical contact with the substrate, such as small electrical probes and electrodes. Therefore, the use of B-doped seeds is highly required as it can result in a well-conductive interfacial layer. In this study, we show by electrically probing the diamond interfacial layer with nanometer-scale resolution using scanning spreading resistance microscopy (SSRM) that Bdoped seeds indeed lead to highly conductive regions at the interface and, in our case, exhibit a resistance similar to the surrounding highly B-doped grown diamond. We conclude that a seed layer that consists of B-doped diamond nanoparticles will allow the formation of diamond films with a wellconductive interfacial layer.

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“…It has been recognised that sample agitation as well as mere immersion of sample into diamond colloids produces excellent coverage of samples with diamond nanoparticles. [23][24][25][26] Here we adopted this approach by immersing samples into nanodiamond suspension. The subsequent growth of nanodiamond films was carried out using MPCVD system.…”

Section: Resultsmentioning

confidence: 99%

A novel Mo-W interlayer approach for CVD diamond deposition on steel

et al. 2015

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Steel is the most widely used material in engineering for its cost/performance ratio and coatings are routinely applied on its surface to further improve its properties. Diamond coated steel parts are an option for many demanding industrial applications through prolonging the lifetime of steel parts, enhancement of tool performance as well as the reduction of wear rates. Direct deposition of diamond on steel using conventional chemical vapour deposition (CVD) processes is known to give poor results due to the preferential formation of amorphous carbon on iron, nickel and other elements as well as stresses induced from the significant difference in the thermal expansion coefficients of those materials. This article reports a novel approach of deposition of nanocrystalline diamond coatings on high-speed steel (M42) substrates using a multi-structured molybdenum (Mo) – tungsten (W) interlayer to form steel/Mo/Mo-W/W/diamond sandwich structures which overcome the adhesion problem related to direct magnetron sputtering deposition of pure tungsten. Surface, interface and tribology properties were evaluated to understand the role of such an interlayer structure. The multi-structured Mo-W interlayer has been proven to improve the adhesion between diamond films and steel substrates by acting as an effective diffusion barrier during the CVD diamond deposition.

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Ultrahigh particle density seeding with nanocrystal diamond particles

Cited by 46 publications

References 5 publications

Optical properties of diamond films grown by MPCVD method with alternating nanodiamond injection

Optical properties of diamond films grown by MPCVD method with alternating nanodiamond injection

Electrical probing of B‐doped diamond seeds embedded into the interfacial layer of a conductive diamond film

A novel Mo-W interlayer approach for CVD diamond deposition on steel

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