2002
DOI: 10.1116/1.1531645
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Ultraviolet-Raman studies of SrTiO3 ultrathin films on Si

Abstract: Few-layer epitaxial graphene grown on vicinal 6H-SiC studied by deep ultraviolet Raman spectroscopy Appl. Phys. Lett. 97, 033108 (2010); 10.1063/1.3466150Combinatorial ( Ba , Sr ) TiO 3 thin film growth: X-ray diffraction and Raman spectroscopy Stoichiometric and nonstoichiometric SrTiO 3 ͑STO͒ films less than 50 nm were grown by molecular beam epitaxy on Si substrates for characterization with UV-Raman spectroscopy. All the films grown have first order phonon Raman scattering as the crystal symmetry has been … Show more

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Cited by 18 publications
(16 citation statements)
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“…So far, UV Raman spectroscopy has not been widely used for ferroelectric films because of technical difficulties such as lower throughput efficiency, insufficient dispersion, and higher stray light level of UV Raman spectrometers compared with those operating in the visible range. Only a room temperature measurement of SrTiO 3 films using 325‐nm excitation has been reported 127 . Recent progress in UV Raman instrumentation has made measurement of ferroelectric ultrathin films possible.…”
Section: Uv Raman Spectroscopy Of Nanoscale Ferroelectric Superlamentioning
confidence: 99%
“…So far, UV Raman spectroscopy has not been widely used for ferroelectric films because of technical difficulties such as lower throughput efficiency, insufficient dispersion, and higher stray light level of UV Raman spectrometers compared with those operating in the visible range. Only a room temperature measurement of SrTiO 3 films using 325‐nm excitation has been reported 127 . Recent progress in UV Raman instrumentation has made measurement of ferroelectric ultrathin films possible.…”
Section: Uv Raman Spectroscopy Of Nanoscale Ferroelectric Superlamentioning
confidence: 99%
“…Recently, room temperature measurement of SrTiO 3 films using 325 nm excitation has been reported (11).…”
mentioning
confidence: 99%
“…23 On the other hand, the corresponding Raman signature from the center region of the wafer in 300-nm-thick epi-STO is very "bulklike" in nature (although the data does exhibit some first-order activity at 180 cm −1 ). The weak optical modes reported here from the 300-nm-thick epi-STO wafer edge region are similar to those observed from the Ti-rich ultrathin STO.…”
Section: -7mentioning
confidence: 99%