2000
DOI: 10.1016/s0169-4332(99)00599-1
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UV/ozone-activated growth of oxide layers on InAs(001) surfaces and oxide desorption under arsenic pressure

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Cited by 11 publications
(2 citation statements)
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“…This value of 0.2 nm was reported previously on a freshly HCl etched InAs surface and was ascribed to oxide while a 2 nm thickness was ascribed to a carbon contaning contamination layer. 22 These observations are in good agreement with ours. The determination of the precise nature of the oxide/ contamination layer would however be required to fully understand the oxide/contamination effect on the observed PL spectrum.…”
Section: Figure 3 Presents Calculated and Experimental Emission Wavelsupporting
confidence: 92%
“…This value of 0.2 nm was reported previously on a freshly HCl etched InAs surface and was ascribed to oxide while a 2 nm thickness was ascribed to a carbon contaning contamination layer. 22 These observations are in good agreement with ours. The determination of the precise nature of the oxide/ contamination layer would however be required to fully understand the oxide/contamination effect on the observed PL spectrum.…”
Section: Figure 3 Presents Calculated and Experimental Emission Wavelsupporting
confidence: 92%
“…We used this equation to extract the thermal conductivity of NWs of different radii and length by measuring the current and voltage at which the NWs breakdown, and equating T max to 793 K, a temperature known to result in the desorption of the native oxide [22][23]. Assuming that the NW failure is initiated at 793 K [24][25], the thermal conductivity is plotted for NWs as a function of their radius in Fig.…”
Section: Ivl T R (6)mentioning
confidence: 99%