2011 IEEE 61st Electronic Components and Technology Conference (ECTC) 2011
DOI: 10.1109/ectc.2011.5898632
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Vacuum underfill technology for advanced packaging

Abstract: We developed vacuum assisted underfill technology for large die (>18 × 18 mm) with fine pitch area array bumps (< 150 m pitch) to solve a critical underfill void issue. Material development and process optimization are the keys to realize a stable process for such an advanced package. It was also confirmed that the newly developed underfill materials have good reliability on the large die package.

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Cited by 2 publications
(2 citation statements)
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“…Post-applied methods [14][15][16][17][18][19] develop on the basis of process and typically utilize dispensing or molding technique to underfill an assembled package. A dominant benefit for post-applied methods is entirely compatibility with current existing SMT facilities.…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…Post-applied methods [14][15][16][17][18][19] develop on the basis of process and typically utilize dispensing or molding technique to underfill an assembled package. A dominant benefit for post-applied methods is entirely compatibility with current existing SMT facilities.…”
Section: Introductionmentioning
confidence: 99%
“…A dominant benefit for post-applied methods is entirely compatibility with current existing SMT facilities. A vacuum capillary underfill (VCUF) introduced by IBM [14,15] employs a low-volatile material to underfill a 3D chip stack. VCUF can be considered as an evolvement of the 2D conventional underfill since the material is dispensed along chip edges in a vacuum-assisted dispensing system.…”
Section: Introductionmentioning
confidence: 99%