Digest. International Electron Devices Meeting,
DOI: 10.1109/iedm.2002.1175896
|View full text |Cite
|
Sign up to set email alerts
|

Variation in natural threshold voltage of NVM circuits due to dopant fluctuations and its impact on reliability

Abstract: The statistical distribution of the natural threshold voltage (VT$ of 512k-bit NVM circuit arrays has been studied for two different technologies. The major source of the Vm variation is dopant fluctuations of the NVM well. An analytical model for the dopant fluctuations provides excellent agreement with the measured circuit VTO variation and NVM cell mismatch for both technologies.The reliability implications of the VTo variation are considered using charge leakage models for data retention.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1

Citation Types

0
4
0

Publication Types

Select...
3
3

Relationship

0
6

Authors

Journals

citations
Cited by 7 publications
(4 citation statements)
references
References 12 publications
0
4
0
Order By: Relevance
“…However, sustaining Moore's law through technology scaling into the nanoscale regime poses several challenges. Chief among these are the hurdles introduced by noise [Kish 2002;Natori et al 1998], parameter variations [Borkar et al 2003], dopant concentration [Burnett et al 2002], etc. Among the challenges posed by statistical behaviors, noise is a fundamental limit for continuing transistor scaling.…”
Section: Introductionmentioning
confidence: 99%
“…However, sustaining Moore's law through technology scaling into the nanoscale regime poses several challenges. Chief among these are the hurdles introduced by noise [Kish 2002;Natori et al 1998], parameter variations [Borkar et al 2003], dopant concentration [Burnett et al 2002], etc. Among the challenges posed by statistical behaviors, noise is a fundamental limit for continuing transistor scaling.…”
Section: Introductionmentioning
confidence: 99%
“…Moreover, these devices do not suffer of drain turn-on effect [3], allowing for cell length scaling and high reading drain voltage. In conventional FG devices, the intra-die variation of natural threshold voltage, due to dopant fluctuations of the well doping, has been ascribed as a major reliability concern as devices continue to scale [4].…”
Section: Introductionmentioning
confidence: 99%
“…Large SRAM arrays are especially vulnerable to variation at low V dd [1,6,7,25,41]. They are optimized for area and power and therefore built using the smallest transistors, which are the most affected by random variation.…”
Section: Near Threshold Computingmentioning
confidence: 99%