2023
DOI: 10.1109/led.2022.3222878
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Vertical β-Ga₂O₃ Schottky Barrier Diodes With Field Plate Assisted Negative Beveled Termination and Positive Beveled Termination

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Cited by 25 publications
(6 citation statements)
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“…The inclination angle of the mesa has an important effect on the performance of the device. Chen et al [199] used SiO 2 and Ni as etching masks to fabricate negative-and positive-beveled mesa structures, respectively. After F plasma treatment and the deposition of bilayer field plate dielectrics, they constructed SBDs as shown in Figure 9a-d.…”
Section: Mesa Termination Structurementioning
confidence: 99%
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“…The inclination angle of the mesa has an important effect on the performance of the device. Chen et al [199] used SiO 2 and Ni as etching masks to fabricate negative-and positive-beveled mesa structures, respectively. After F plasma treatment and the deposition of bilayer field plate dielectrics, they constructed SBDs as shown in Figure 9a-d.…”
Section: Mesa Termination Structurementioning
confidence: 99%
“…This indicates that SABFP can more effectively alleviate the concentration of electric fields. [199]; (e) β-Ga2O3 BFP and SABFP SBDs [200]. [199]; (e) β-Ga 2 O 3 BFP and SABFP SBDs [200].…”
Section: Mesa Termination Structurementioning
confidence: 99%
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“…Gallium oxide (Ga 2 O 3 ) has excellent properties of a large band gap of 4.2-4.9 eV [1][2][3], a high theoretical avalanche breakdown field of 8.0 MV cm −1 [4,5], high thermal stability, and low production cost [6][7][8], becoming the next generation of excellent ultra-wide-band-gap semiconductor material. Due to these advantages, Ga 2 O 3 power metal-oxide-semiconductor field-effect transistors (MOSFETs) have become a strong contender in future power devices in space applications.…”
Section: Introductionmentioning
confidence: 99%
“…In response to the aforementioned challenges, numerous edge termination and reduced surface field (RESURF) structures have been developed for β -Ga 2 O 3 SBD. The main edge termination structures include field plate (FP), [8][9][10][11] resistive termination, [7,[12][13][14][15][16] guard ring, [17,18] high barrier anode edge, [19] mesa termination, [20][21][22] junction termination extension (JTE), [23][24][25][26] and floating field rings (FFRs). [27][28][29] As for the surface field control of the main Schottky junction, there are feasible solutions such as metal-oxide-semiconductor (MOS) type trench fin, [30][31][32] and heterojunction barrier Schottky diode.…”
Section: Introductionmentioning
confidence: 99%