Virtual measuring instruments are useful tools in surface topography measurement and can be applied for the prediction of measuring results and the determination of measurement uncertainty. For optical measuring instruments, often computationally expensive ray-tracing algorithms are applied. Other models provide an approximation of the transfer behavior based on techniques from signal processing or physical considerations of the instrument setup. For confocal microscopy, we suggest the application of a hybrid model which combines a linear filter model with limitations caused by physical properties of the measuring instrument. The application of the comprehensive model and the estimation of measurement uncertainty based on the instrument characteristics are presented. The results are in good compliance with experimental data and the model requires very few computing effort. An easy-to-use approach to implement the corresponding models for a specific measuring instrument is presented.