1999
DOI: 10.1557/s109257830000065x
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Visible-Blind UV Digital Camera Based On a 32 × 32 Array of GaN/AlGaN p-i-n Photodiodes

Abstract: A visible-blind UV camera based on a 32 x 32 array of backside-illuminated GaN/AlGaN p-i-n photodiodes has been successfully demonstrated. Each of the 1024 photodiodes in the array consists of a base n-type layer of AlGaN (~20%) onto which an undoped GaN layer followed by a p-type GaN layer is deposited by metallorganic vapor phase epitaxy. Double-side polished sapphire wafers are used as transparent substrates. Standard photolithographic, etching, and metallization procedures were employed to obtain fully-pro… Show more

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Cited by 58 publications
(27 citation statements)
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“…For low noise detection, detectivity should be as high as possible. The typical detectivity of a cooled PMT is about cm Hz W around 300 nm [13]. A comparable detectivity performance ( cm Hz W at 275 nm) was reported recently with a solar-blind AlGaN-based back-illuminated p-i-n photodiode [14].…”
supporting
confidence: 79%
“…For low noise detection, detectivity should be as high as possible. The typical detectivity of a cooled PMT is about cm Hz W around 300 nm [13]. A comparable detectivity performance ( cm Hz W at 275 nm) was reported recently with a solar-blind AlGaN-based back-illuminated p-i-n photodiode [14].…”
supporting
confidence: 79%
“…It shows that the ratio reaches about 63 at around -3.5 V. This is expected since the dynamic resistance of a photodiode becomes maximum near the zero-bias condition. 33 Such a high value of the photo-to-dark current ratio indicates that the structure is most sensitive to UV photons at around -3.5 V. Photocurrents (I P ) were measured by irradiating the sample with light of wavelength k at a fixed bias voltage. Figure 4 shows the results of the spectral response of the photocurrent measurements at the three bias voltages of -1, -2, and -5 V. It is observed that, irrespective of the bias voltage, there is only a small rise in the photocurrent value from 750 nm onwards, resulting in a broad hump extending to 450 nm.…”
Section: Resultsmentioning
confidence: 99%
“…To that end, we use a model originally introduced by Bube for the case of Hall effect in inhomogeneous materials. 19 Since the GaN film is known to grow in columnar structure, it may be viewed as composed of two materials: one represents the bulk of each grain and possesses low resistivity, 1 ; the other has high resistivity, 2 , representing the grain boundaries, where defects trap charges and repel free carriers. The added resistivity of the grain boundaries gives rise to an additional Hall voltage produced over these boundaries.…”
Section: Modelmentioning
confidence: 99%
“…2 For lack of adequate GaN substrates, GaN films are commonly grown on substrates to which they are both lattice and thermally mismatched. Typical growth process starts with the formation of a highly defective nucleation layer at temperatures lower than the typical growth temperature providing a bridge over the lattice mismatch.…”
Section: Introductionmentioning
confidence: 99%