2008
DOI: 10.1103/physrevb.78.064201
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Voltage-assisted asperity formation in styrene butadiene at room temperature: Cross-linking at the nanoscale

Abstract: Nanoscale surface modification is reported for styrene butadiene rubber using an electrically biased conducting atomic force microscope tip. Under appropriate bias conditions, the local electric field magnitude is of the order of 10 8 -10 9 V m −1 , which is sufficiently large to initiate cross-linking in the rubber. Peaklike surface features, surrounded by a circular trough and a raised ring, are created by careful and controlled retraction of the biased tip. The features' aspect ratios can be controlled by m… Show more

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Cited by 4 publications
(4 citation statements)
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“…AFMEN in styrene butadiene rubber: We combine AFMEN with the tip manipulation to pattern nanostructures in the SBR. A prime goal was to elucidate the macromolecule behavior in extreme electric field 10 9 Vm -1 using modified AFMEN protocol [6]. The results of nanopatterning are presented in Fig.…”
Section: Afmen In Polymersmentioning
confidence: 99%
See 1 more Smart Citation
“…AFMEN in styrene butadiene rubber: We combine AFMEN with the tip manipulation to pattern nanostructures in the SBR. A prime goal was to elucidate the macromolecule behavior in extreme electric field 10 9 Vm -1 using modified AFMEN protocol [6]. The results of nanopatterning are presented in Fig.…”
Section: Afmen In Polymersmentioning
confidence: 99%
“…Essentially AFMEN causes the polymer to deform and flow to the shape of the applied electric field. During past decade, the AFMEN and its modifications have proven to be effective when applied in graphene fluoride (GF) [4], silicon pretreated with solvents [5], and styrene butadiene rubber (SBR) [6].…”
Section: Introductionmentioning
confidence: 99%
“…Atomic Force Microscopy Electrostatic Nanolithography (AFMEN) is a technique that can be used for patterning and functionalization at the nanoscale (20 -100 nm). It is a technique that has shown to be applicable to a wide variety of materials including PMMA, PS, CdS, Si, and SBR 19,45,46 . We will demonstrate that the process is also The advantage to this protocol is repeatability and ability to produce variable height nanostructures with a high degree of precision.…”
Section: Afmen (Afm-assisted Electrostatic Nanolithography) Techniquementioning
confidence: 99%
“…This technique combines the two protocols to produce a method that allows even more control over feature formation. It has been utilized to induce cross linking at the nanoscale in SBR 46 and it shall be demonstrated in this research that it is an effective way to deposit charge at the nanoscale 47…”
Section: Z-am-afmenmentioning
confidence: 99%