VUV laser (157 nm) chemical vapor deposition of high quality amorphous hydrogenated silicon: gas phase chemistry and modelling

Electron trapping by excited microvoids (ETEM)—an explanation of the Staebler–Wronski effect

“…H is bound mostly as Si-H, but also a small percentage of SiH 2 -groups have been found. Under extreme conditions even molecular hydrogen has been detected in a-Si:H, and recent results let it assume plausible that even at room temperature a small amount of H 2 is present [1][2][3][4][5][6][7][8][9]. It has been estimated [10] for monohydridic bonds (R 3 Si-H) within the silicon frame, 10% is assumed to be present in a molecular form, and the rest can presumably be found in a kind of Si-H bonds at inner microvoid surfaces (see below).…”

F 2 -laser ablation and micro-patterning of GaPO 4

“…For such applications, F 2 -lasers replace standard ArF and KrF excimer lasers. Fluorine lasers have been employed for high-quality surface patterning and micro-machining of chemically inert and wide-band-gap materials such as quartz and polytetrafluoroethylene (PTFE) [2], refractive index engineering [3] and the fabrication of photonic components [4], laser cleaning [5], micro-manipulation of biological cells [6] and the deposition of thin films [7][8][9]. Furthermore, F 2 -lasers are successfully employed for nano-lithography applications producing structures well below 100 nm in size [10].…”

Photoinduced Chemical Vapor Deposition of Amorphous Carbon Films from Chloromethane Using a VUV Laser (157 nm)

“…Deposition. The experimental setup used for the photodeposition of a-C:H,Cl has been explained elsewhere 9 and is described here only briefly. The photoinduced decomposition of the reactant gas molecules was carried out using a Lambda Physik LPF 205 fluorine laser in a parallel configuration with respect to the substrates.…”