Wavelength dependence of carbon contamination on mirrors with different capping layers

Thomas, Petros; Yankulin, Leonid; Khopkar, Yashdeep; Garg, Rashi; Mbanaso, Chimaobi; Antohe, Alin; Fan, Yu-Jen; Denbeaux, Gregory; Aouadi, Samir; Jindal, V. K.; Wüest, Andrea

doi:10.1117/12.847015

Cited by 4 publications

(1 citation statement)

References 3 publications

(6 reference statements)

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“…The general trend of increasing contamination rate with wavelength in the rage (10 to 80) nm has been observed experimentally 18 and predicted by models 19 . A likely explanation of this behavior is that both the (gas phase) photoadsorption cross section and the secondary electron yield for C increase to a maximum around 70 nm.…”

Section: Wavelength Scalingmentioning

confidence: 81%

Optics contamination studies in support of high-throughput EUV lithography tools

et al. 2011

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We report on optics contamination rates induced by exposure to broad-bandwidth, high-intensity EUV radiation peaked near 8 nm in a new beamline at the NIST synchrotron. The peak intensity of 50 mW/mm2 allows extension of previous investigations of contamination by in-band 13.5 nm radiation at intensities an order of magnitude lower. We report nonlinear pressure and intensity scaling of the contamination rates which is consistent with the earlier lower-intensity studies. The magnitude of the contamination rate per unit EUV dose, however, was found to be significantly lower for the lower wavelength exposures. We also report an apparent dose-dependent correlation between the thicknesses as measured by spectroscopic ellipsometry and XPS for the carbon deposits created using the higher doses available on the new beamline. It is proposed that this is due to different sensitivities of the metrologies to variations in the density of the deposited C induced by prolonged EUV irradiation

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Section: Wavelength Scalingmentioning

confidence: 81%

Optics contamination studies in support of high-throughput EUV lithography tools

et al. 2011

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Evidence Against Carbonization of the Thin-Film Filters of the Extreme Ultraviolet Variability Experiment Onboard the Solar Dynamics Observatory

et al. 2021

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Upgrade of beamline BL08B at Taiwan Light Source from a photon-BPM to a double-grating SGM beamline

Yuh

Lin

Liang

et al. 2015

J Synchrotron Radiat

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During the last 20 years, beamline BL08B has been upgraded step by step from a photon beam-position monitor (BPM) to a testing beamline and a single-grating beamline that enables experiments to record X-ray photo-emission spectra (XPS) and X-ray absorption spectra (XAS) for research in solar physics, organic semiconductor materials and spinel oxides, with soft X-ray photon energies in the range 300-1000 eV. Demands for photon energy to extend to the extreme ultraviolet region for applications in nano-fabrication and topological thin films are increasing. The basic spherical-grating monochromator beamline was again upgraded by adding a second grating that delivers photons of energy from 80 to 420 eV. Four end-stations were designed for experiments with XPS, XAS, interstellar photoprocess systems (IPS) and extreme-ultraviolet lithography (EUVL) in the scheduled beam time. The data from these experiments show a large count rate in core levels probed and excellent statistics on background normalization in the L-edge adsorption spectrum.

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Wavelength dependence of carbon contamination on mirrors with different capping layers

Cited by 4 publications

References 3 publications

Optics contamination studies in support of high-throughput EUV lithography tools

Optics contamination studies in support of high-throughput EUV lithography tools

Evidence Against Carbonization of the Thin-Film Filters of the Extreme Ultraviolet Variability Experiment Onboard the Solar Dynamics Observatory

Upgrade of beamline BL08B at Taiwan Light Source from a photon-BPM to a double-grating SGM beamline

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