“…To date, Fe has been found to be a frequent contaminant in GaN thin films grown by metal organic vapor phase epitaxy (MOVPE), hydride vapor phase epitaxy (HVPE) [9,12], and by the sublimation sandwich method with typical Fe concentrations around 10 17 -10 18 cm −3 [7,8]. On the other hand, attempts to intentionally produce Fe deep centers by doping during growth or by means of ion implantation have not been very successful [3,13,14].…”