We report on room temperature laser action of an all monolithic ZnO-based vertical cavity surface emitting laser (VCSEL) under optical pumping. The VCSEL structure consists of a 2λ microcavity containing 8 ZnO/Zn0.92Mg0.08O quantum wells embedded in epitaxially grown Zn0.92Mg0.08O/Zn0.65Mg0.35O distributed Bragg reflectors (DBRs). As a prerequisite, design and growth of high reflectivity DBRs based on ZnO and (Zn,Mg)O for optical devices operating in the ultraviolet and blue-green spectral range are discussed.Semiconductor lasers operating in the ultraviolet (UV) and blue spectral range have become of great technological importance, e.g., for data storage applications. Compared to the commonly employed edge-emitting devices, vertical cavity surface emitting lasers (VCSELs) offer several advantages such as single mode emission, a circular beam profile, and the possibility for integration into two dimensional arrays. VCSELs based on GaN and its alloys reached a promising stage of development [1] and laser devices working in the strong exciton-photon coupling regime, so called polariton lasers, have been demonstrated at room temperature [2]. In principle, with ZnObased alloys, a similar spectral range can be covered as with the (Al,In,Ga)N heterosystem. Room temperature lasing of (Zn,Cd)O/ZnO quantum well (QW) structures was achieved from UV to green wavelengths [3]. In the strong coupling regime, ZnO was predicted to be even superior due to its high oscillator strength and exciton binding energy [4,5]. However, necessary prerequisites to both VCSELs and polariton lasers are microcavities (MCs) with a high quality factor and good optical quality ZnO active layers. So far only hybrid MCs [6-9] consisting of, e.g., an epitaxially grown GaN-based bottom distributed Bragg reflector (DBR), a ZnO active layer, and a top dielectric DBR have been employed.In this letter, we report on the monolithic growth of ZnO and (Zn,Mg)O based DBRs and MCs by radicalsource molecular beam epitaxy (MBE). With a properly chosen DBR ternary alloy composition, it is possible to obtain high reflectivities with a moderate number of mirror pairs in the range from 375 nm to 500 nm. Finally, we demonstrate an UV emitting all-ZnO VCSEL.The samples are grown in a commercial DCA-450 MBE apparatus equipped with standard metal sources and a radical plasma cell for oxygen. A-plane (1120) sapphire wafers are used as substrates. The (Zn,Mg)O DBRs and MCs containing ZnO/(Zn,Mg)O QWs are grown without interruption at T g = 340 • C with an oxygen limited growth rate of 330 nm/h, which was previously determined from oscillations in the specular beam intensity of in situ reflected high-energy electron diffraction (RHEED) [3]. Note that the low T g allows for the growth