2012
DOI: 10.1016/j.materresbull.2012.05.054
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ZnO film with ultra-low background electron concentration grown by plasma-assisted MBE using Mg film as the buffer layer

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Cited by 16 publications
(3 citation statements)
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“…Before growth, the substrate was annealed at 750°C at vacuum for 15 min and subsequently exposed in oxygen plasma for another 5 min. A designed four-step buffer layers were deposited in sequence for reducing the mismatch between the epitaxial films and the substrate [34]. It is found that the N atoms are hardly doped into the ZnO and BeZnO as the flux of oxygen ðFO 2 Þ is as low as $1.0 sccm (the minimum flux at RF plasma generator normal operating pressures).…”
Section: Methodsmentioning
confidence: 99%
“…Before growth, the substrate was annealed at 750°C at vacuum for 15 min and subsequently exposed in oxygen plasma for another 5 min. A designed four-step buffer layers were deposited in sequence for reducing the mismatch between the epitaxial films and the substrate [34]. It is found that the N atoms are hardly doped into the ZnO and BeZnO as the flux of oxygen ðFO 2 Þ is as low as $1.0 sccm (the minimum flux at RF plasma generator normal operating pressures).…”
Section: Methodsmentioning
confidence: 99%
“…The details of the buffer technique can be found in our previous work. [16] The doping content was controlled by the source temperature, i.e., higher source temperature cor-responds to a higher doping level. In the nitrogen-doped samples, the flow rate was kept constant.…”
Section: Sample Fabricationmentioning
confidence: 99%
“…ZnO with its direct wide band gap (E g ) of ∼3.37eV and large exciton binding energy of ∼60meV has enormous potential for optoelectronic applications. However, the impediment to realizing such devices is the difficulty to achieve sustainable p-type doping [1,2]. As grown ZnO layers often exhibit n-type conductivity due to the presence of certain native point defects [3,4] acting as unintentional donors, which fully compensate the p-type doping.…”
Section: Introductionmentioning
confidence: 99%