2018
DOI: 10.1016/j.ijhydene.2018.04.054
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ZnO thin films deposited by RF magnetron sputtering: Effects of the annealing and atmosphere conditions on the photocatalytic hydrogen production

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Cited by 78 publications
(21 citation statements)
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“…The results regarding Zn and O contents were 51.4 and 48.3 at%, respectively, confirming the expected deficiency of oxygen in ZnO produced by a sputtering process without O in the sputtering chamber. This oxygen deficiency is often reported . The same deficiency was observed for the as‐grown undoped ZnO films (51.4 at% for Zn and 48.3 at% for O).…”
Section: Resultssupporting
confidence: 79%
“…The results regarding Zn and O contents were 51.4 and 48.3 at%, respectively, confirming the expected deficiency of oxygen in ZnO produced by a sputtering process without O in the sputtering chamber. This oxygen deficiency is often reported . The same deficiency was observed for the as‐grown undoped ZnO films (51.4 at% for Zn and 48.3 at% for O).…”
Section: Resultssupporting
confidence: 79%
“…These two ZnO thin film samples showed an optical transmittance value of approximately 83% in the wavelength range of 300-800 nm. This result is in the common level (75%-90%) of the optical transmittance for ZnO thin films [34,35]. Meanwhile, in the wavelength range of 300-370 nm, the as-received ZnO thin film on the quartz glass substrate exhibited a transmission of about 20%, which was much lower than that on the sapphire (001) substrate (approximately 60%).…”
Section: Resultsmentioning
confidence: 70%
“…The 529.3 and 531.2 peaks were associated with the O 2− ions on the O-Zn and O-Al bonds, so it can be assumed that these ions are located at the ZnO x and AlO x sites (tetrahedral or octahedral) in the spinel [ 28 ]. The peak located at 532.6 eV was associated with the chemisorbed oxygen on the material’s surface [ 29 , 30 ].…”
Section: Resultsmentioning
confidence: 99%