Due to its independency to the substrate used, Soft mold NanoImprint Lithography (S-NIL) is a technique of great interest in particular for the fabrication of optical devices. We demonstrate a mature pathway for the realization of optical filters from the conception to the optical characterization. Those filters can be realized on large surfaces (up to 6'' diameter wafers) with high conformity on various substrates. Quality of the transfer will be discussed throughout the process and optical performances compared to those obtained with classical techniques. In this paper we fabricated tunable spectral filters with a grating periodicity down to 260 nm and imprint surfaces up to 6''. Physical conformity of the gratings will be discussed in terms of long-range stitching obtained on 6'' Si hard mold, dimensional shrinkage during thermal NanoImprint on Zeonor® soft mold and conformity towards patterned hard mold throughout the process.

Due to its independency to the substrate used, Soft mold NanoImprint Lithography (S-NIL) is a technique of great interest in particular for the fabrication of optical devices. We demonstrate a mature pathway for the realization of optical filters from the conception to the optical characterization. Those filters can be realized on large surfaces (up to 6'' diameter wafers) with high conformity on various substrates. Quality of the transfer will be discussed throughout the process and optical performances compared to those obtained with classical techniques. In this paper we fabricated tunable spectral filters with a grating periodicity down to 260 nm and imprint surfaces up to 6''. Physical conformity of the gratings will be discussed in terms of long-range stitching obtained on 6'' Si hard mold, dimensional shrinkage during thermal NanoImprint on Zeonor® soft mold and conformity towards patterned hard mold throughout the process.

Due to their narrow reflection peak as well as their compact structure, Guided Mode Resonance Filters (GMRFs) are attractive for many applications. We demonstrate the possibility to modulate the properties of a GMRF by associating it with liquid crystals (LCs). By impregnating the diffraction grating with LCs, it is possible to switch between an active and an inactive state depending on the polarization of the light or the applied voltage. In this paper we fabricated and characterized the first diffraction order of LCimpregnated gratings with different periods (0,8 to 5,0µm) and depths (130 to 840nm) to test the ability of liquid crystals to adjust the diffraction properties. Finally, around 99.8% of diffraction intensity turns off with a 90° rotation polarization at zero voltage and 90 to 99% by applying a voltage of 30V according to the grating dimensions. The effect of the grating dimension on the diffraction modulation capacity are discussed.

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