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Texture goniometry of thin layers needs intensity corrections in Bragg–Brentano or low‐incidence geometries. These intensity corrections are described for the case where the diffracting volume consists of a single layer or bilayers. As an application, the respective orientations of aluminium thin films deposited on steel and bilayers of aluminium/iron deposited on silicon wafers are studied. The orientation relationship between iron and silicon is (111)Si||(110)Fe and between aluminium and iron is (111)Al||(110Fe) with [011]Al||[100]Fe.