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Wheat mutants with a reduced chlorophyll synthesis are affected by a defective control of the photosynthetic electron flow, but tend to recover a wild-type phenotype. The sensitivity of some mutants to light fluctuations suggested that cultivation outdoors could significantly impact productivity. Six mutant lines of Triticum durum or Triticum aestivum with their respective wild-type cultivars were cultivated with a regular seasonal cycle (October–May) in a semi-field experiment. Leaf chlorophyll content and fluorescence parameters were analysed at the early (November) and late (May) developmental stages, and checked for correlation with morphometric and grain-production parameters. The alleviation of the phenotype severity concerned primarily the recovery of the photosynthetic-membrane functionality, but not the leaf chlorophyll content. Photosystem II (PSII) was less photoprotected in the mutants, but a moderate PSII photoinhibition could help control the electron flow into the chain. The accumulation of interchain electron carriers was a primary acclimative response towards the naturally fluctuating environment, maximally exploited by the mature durum-wheat mutants. The mutation itself and/or the energy-consuming compensatory mechanisms markedly influenced the plant morphogenesis, leading especially to reduced tillering, which in turn resulted in lower grain production per plant. Consistently with the interrelation between early photosynthetic phenotype and grain-yield per plant, chlorophyll-fluorescence indexes related to the level of photoprotective thermal dissipation (pNPQ), photosystem II antenna size (ABS/RC), and pool of electron carriers (Sm) are proposed as good candidates for the in-field phenotyping of chlorophyll-deficient wheat.

The Lycophyte Selaginella martensii efficiently acclimates to diverse light environments, from deep shade to full sunlight. The plant does not modulate the abundance of the Light Harvesting Complex II, mostly found as a free trimer, and does not alter the maximum capacity of thermal dissipation (NPQ). Nevertheless, the photoprotection is expected to be modulatable upon long‐term light acclimation to preserve the photosystems (PSII, PSI). The effects of long‐term light acclimation on PSII photoprotection were investigated using the chlorophyll fluorometric method known as “photochemical quenching measured in the dark” (qPd). Singularly high‐qPd values at relatively low irradiance suggest a heterogeneous antenna system (PSII antenna uncoupling). The extent of antenna uncoupling largely depends on the light regime, reaching the highest value in sun‐acclimated plants. In parallel, the photoprotective NPQ (pNPQ) increased from deep‐shade to high‐light grown plants. It is proposed that the differences in the long‐term modulation in the photoprotective capacity are proportional to the amount of uncoupled LHCII. In deep‐shade plants, the inconsistency between invariable maximum NPQ and lower pNPQ is attributed to the thermal dissipation occurring in the PSII core.

The objective of this project is evaluating the potential of microbes (fungi and bacteria) for the depolymerization of epoxy, aiming at the development of a circular management of natural resources for epoxy in a long-term prospective. For depolymerization, epoxy samples were incubated for 1, 3, 6 and 9 months in soil microcosms inoculated with Ganoderma adspersum. Contact angle data revealed a reduction in the hydrophobicity induced by the fungus. Environmental scanning electron microscopy on epoxy samples incubated for more than 3 years in microbiological water revealed abundant microbiota. This comprised microbes of different sizes and shapes. The fungi Trichoderma harzianum and Aspergillus calidoustus, as well as the bacteria Variovorax sp. and Methyloversatilis discipulorum, were isolated from this environment. Altogether, these results suggest that microbes are able to colonize epoxy surfaces and, most probably, also partially depolymerize them. This could open promising opportunities for the study of new metabolisms potentially able depolymerize epoxy materials.