We present electrical transport and optical properties of Ta-doped TiO2 epitaxial thin films with varying Ta concentration grown by the pulsed laser deposition method. The Ti0.95Ta0.05O2 film exhibited a resistivity of 2.5×10-4 Ω cm at room temperature, and an internal transmittance of 95% in the visible light region. These values are comparable to those of a widely used transparent conducting oxide (TCO), indium tin oxide. Furthermore, this new material falls into a new category of TCOs that utilizes d electrons.

Nb-doped anatase TiO2 [Ti0.94Nb0.06O2 (TNO)] films with high electrical conductivity and transparency were fabricated on nonalkali glass using pulsed laser deposition and subsequent annealing in a H2 atmosphere. The amorphous films as deposited on unheated substrates were found to crystallize, forming polycrystalline films at around 350°C. The films annealed at 500°C showed resistivity down to 4.6×10−4Ωcm at room temperature and optical transmittance of 60%–80% in the visible region, which are comparable to those of epitaxial films. These results indicate that TNO films have the potential to be practical transparent conducting oxides that could replace indium tin oxide.

Nb-doped anatase TiO 2 (Ti 0:94 Nb 0:06 O 2 ) films with excellent conductivity and transparency were deposited on non-alkali glass by pulsed laser deposition. X-ray diffraction analysis and transmission electron microscopy confirmed that the obtained films were polycrystalline with anatase structure. The films deposited at a substrate temperature of 250 C with subsequent H 2 annealing at 500 C showed a resistivity of 1:5 Â 10 À3 Ácm at room temperature and an optical transmittance of 60 -80% in the visible region. These results indicate that anatase Ti 0:94 Nb 0:06 O 2 has great potential as a transparent conducting oxide that could replace Sn-doped In 2 O 3 (ITO).

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