A new type of ferroelectric gate field-effect transistor (FET) using ferroelectric-insulator interface conduction has been proposed. Drain current flows along the interface between the ferroelectric and insulator layers and requires no semiconductor. The channel region of the FET is composed of a Pt/insulator HfO 2 /ferroelectric Pb(Zr 0:52 Ti 0:48 )O 3 (PZT)/Pt/TiO 2 /SiO 2 /Si multilayer, and the source and drain areas are formed at the interface of the PZT and HfO 2 films. Drain current versus gate voltage characteristics show a clockwise hysteresis loop similar to that for a conventional p-channel transistor. The FET shows that the on/off ratio of the conduction current is within 10 5 to 10 6 and that the off-state current is about 10 À10 A.

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