Antiphase boundaries in GaAs have been produced by growing the GaAs on {001} Ge substrates. The GaAs was grown by the technique of organometallic vapor phase epitaxy to a thickness in excess of 1 μm. The antiphase boundaries are shown to be faceted with facets parallel to the {110} planes being particularly common. The rigid-body translation at the different facet planes is shown to be small for the {110} planes but it can be large for other facet planes.

No abstract

No abstract

Gax In1 − x Pepilayers grown under a range of growth conditions by organometallic vapor phase epitaxy (OMVPE) on GaAs substrates have been studied in the electron microscope. The results show the presence of an ordering of the group III sublattice parallel to some of the {111} planes. Dark-field images directly reveal ordered domains of different orientations that appear not to be perfect, but contain many planar defects parallel to the growth surface.

No abstract