In situ Hall-effect measurements have been carried out on vapour-phase-grown, n-type ZnO irradiated with 1.0 and 1.5 MeV electrons in the [000-1] direction. The electrical properties change very little during irradiation at temperatures as low as 130 K, the lowest temperature presently attainable under 1 MeV, 0.3 µA cm −2 irradiation. It is concluded that long-term damage in ZnO is limited by defect annihilations that are rapid on the time scale of the experiment (<1 min), even at 130 K.
Current–voltage (I–V) measurements of Ag/n-ZnO have been carried out at temperatures of 200–500 K in order
to understand the temperature dependence of the diode characteristics. Forward-bias
I–V
analysis results in a Schottky barrier height of 0.82 eV and an ideality factor of 1.55
at room temperature. The barrier height of 0.74 eV and Richardson constant of
0.248 A K−2 cm−2
were also calculated from the Richardson plot, which shows nearly
linear characteristics in the temperature range 240–440 K. From the
nkbT/q versus
kbT/q graph, where
n is ideality factor,
kb the Boltzmann
constant, T the
temperature and q
the electronic charge we deduce that thermionic field emission (TFE) is
dominant in the charge transport mechanism. At higher sample temperatures
(>440 K),
a trap-assisted tunnelling mechanism is proposed due to the existence of a deep donor situated at
Ec—0.62 eV
with 3.3 × 10−15 cm2
capture cross section observed by both deep-level transient spectroscopy (DLTS) and
lnI0
versus 1/kbT
plots. The ideality factor almost remains constant in the temperature range 240–400 K,
which shows the stability of the Schottky contact in this temperature range.
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.