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We report the first demonstration of scaled Ge p-channel FinFET devices fabricated on a Si bulk FinFET baseline using the Aspect-Ratio-Trapping (ART) technique [1]. Excellent subthreshold characteristics (long-channel subthreshold swing SS=76mV/dec at 0.5V), good SCE control and high transconductance (1.2 mS/µm at 1V, 1.05 mS/µm at 0.5V) are achieved. The Ge FinFET presented in this work exhibits highest g m /SS at V dd =1V reported for non-planar unstrained Ge pFETs to date.

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