In this paper, we present a low cost approach to produce large-area polymer sheets with sub-wavelength nanostructures. The fabricated polymer films would have great potentials to attach to optical or solar-cell-related consumer products when anti-reflection/anti-glaring is mandatory. We employed a special electron cyclotron resonance (ECR) plasma process to fabricate the SWSs with large area directly on silicon substrates. Homogeneously distributed nanotips on the full 4 inch silicon substrate were fabricated by using gas mixtures of silane, methane, argon and hydrogen. An Ni-Co metal mold with a hardness of 550 HV was produced through the replication of the Si mold by electroplating. Afterwards, the molding process was applied to manufacture the nanostructures in PMMA plates in large volume. The nanostructures in PMMA plates with aspect ratios of 4 and diameters of 150 nm were fabricated. The fabricated PMMA sheets could generate the gradient of the refractive indices, absorb the light and greatly reduce the reflectivity. Compared with the PMMA without SWSs, the reflectivity of PMMA with SWSs decreased dramatically from 4.25% to 0.5% at the wavelength of light from 400 to 800 nm.

An antireflective optical film with subwavelength structures replicated by use of a roll-to-roll micro-replication process (RMRP) is investigated. Firstly, a single layer of a nanostructure on a polymer film is designed for an antireflection purpose by the finite difference time domain method in the visible light spectrum. Structures of a conical cylinder array, with spatial period of 400 nm, diameter of 200 nm and height of 350 nm, are numerically obtained. Then, such structures are fabricated by RMRP combining originated structure fabrication realized by deep ultraviolet lithography and dry etching, Ni mold electroplating and replication by using the roll-to-roll process imprinting into the flexible polyethylene terephthalate substrate. A nanostructure roller mold bonded with Ni molds has been successfully fabricated and coated with the self-assembly monolayer process for the purpose of fabricating an anti-adhesion film and improving the lifetime of the Ni molds. The duplicated nanostructure films show a good optical quality of antireflection (AR 2.45% in a 400-700 nm spectral range) and are in good agreement with the theoretical predictions. The experimental results show that the developed process is a promising and cost-effective method for the continuous duplication of flexible devices with nano-scaled feature sizes used in nanophotonics by RMRP.

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