We report on the first fabrication of nanostructures with exactly resonant light revealing the quantum character of the atom-light interaction. Classically the formation of nanostructures is not expected; thus, the observed formation of complex periodic line patterns can be explained only by treating atom-light interaction and propagation of the atoms quantum mechanically. Our numerical quantum calculations are in quantitative agreement with this experimental finding. Moreover, the theory predicts that for small detunings nanostructures with lambda/4 period can be produced, which beats the standard nanofabrication limit of lambda/2. Our experiments confirm this prediction.
This paper describes the principle and performance of FlexRay, a fully programmable illuminator for high NA immersion systems. Sources can be generated on demand, by manipulating an array of mirrors instead of the traditional way of inserting optical elements and changing lens positions. On demand (freeform) source availability allows for reduction in R&D cycle time and shrink in k1. Unlimited tuning allows for better machine to machine matching. FlexRay has been integrated in a 1.35NA TWINSCAN exposure system. We will present data of FlexRay using measured traditional and freeform illumination sources. In addition system performance qualification data on stability, reproducibility and imaging will be shown. The benefit of FlexRay for SMO enabling shrink is demonstrated using an SRAM example.
The application of customized and freeform illumination source shapes is a key enabler for continued shrink using 193 nm water based immersion lithography at the maximum possible NA of 1.35. In this paper we present the capabilities of the DOE based Aerial XP illuminator and the new programmable FlexRay illuminator. Both of these advanced illumination systems support the generation of such arbitrarily shaped illumination sources. We explain how the different parts of the optical column interact in forming the source shape with which the reticle is illuminated. Practical constraints of the systems do not limit the capabilities to utilize the benefit of freeform source shapes vs. classic pupil shapes. Despite a different pupil forming mechanism in the two illuminator types, the resulting pupils are compatible regarding lithographic imaging performance so that processes can be transferred between the two illuminator types. Measured freeform sources can be characterized by applying a parametric fit model, to extract information for optimum pupil setup, and by importing the measured source bitmap into an imaging simulator to directly evaluate its impact on CD and overlay. We compare measured freeform sources from both illuminator types and demonstrate the good matching between measured FlexRay and DOE based freeform source shapes.
Light forces are a powerful tool for neutral atom manipulation and have been used previously to focus an atomic beam onto a substrate to create periodic nanostructures. We utilize the material-selective characteristic of the atom–light interaction to structure the material composition of a film during growth. A host and a dopant material are evaporated simultaneously, but only the dopant is focused by the light field. The dopant concentration varies laterally on a sub-100-nm-length scale. This technique can be extended to three-dimensional patterning and opens up ways to engineer the photonic, electronic, or magnetic features of a solid.
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