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We demonstrate thin-film GaSb solar cells which are isolated from a GaSb substrate and transferred to a Si substrate. We epitaxially grow ∼3.3 μm thick GaSb P on N diode structures on a GaSb substrate. Upon patterning in 2D arrays of pixels, the GaSb films are released via epitaxial lift-off and they are transferred to Si substrates. Encapsulation of each pixel preserves the structural integrity of the GaSb film during lift-off. Using this technique, we consistently transfer ∼4 × 4 mm2 array of pixelated GaSb membranes to a Si substrate with a ∼ 80%–100% yield. The area of individual pixels ranges from ∼90 × 90 μm2 to ∼340 × 340 μm2. Further processing to fabricate photovoltaic devices is performed after the transfer. GaSb solar cells with lateral sizes of ∼340 × 340 μm2 under illumination exhibit efficiencies of ∼3%, which compares favorably with extracted values for large-area (i.e., 5 × 5 mm2) homoepitaxial GaSb solar cells on GaSb substrates.

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