We present a novel structured pattern projection tool for stress, and topography measurement of solar cells. The presented tool has expanded (two standard deviations) accuracy and repeatability of 0.5 mm, exceeding current industry requirements (±0.05 mm one standard deviation). Measurements on the R&D system indicate that this technology is capable of performing measurements with a throughput exceeding 2000 wafers per hour.

We present novel fiber optics low coherence interferometer apparatus, and novel probe for in-situ characterization of semiconductor structures for IR detector manufacturing. Probe does not exhibit polarization, or strain sensitivity observed in earlier invented systems. In addition it is demonstrated to be able to operate with varying length of optical fibers.

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