The effects of oxygen on the mechanical properties and the lattice strain of commercial pure CP) Ti and Ti-6Al-4V alloys are discussed here in terms of the Vickers hardness, tensile strength and elongation. The Vickers hardness and tensile strength of the CP Ti and the Ti-6Al-4V alloys increased with an increase in the oxygen concentration. On the other hand, the elongation of the CP Ti decreased considerably as the oxygen concentration increased, while that of the Ti-6Al-4V alloys gradually decreased as the oxygen concentration increased. Thus, the oxygen concentration has a greater effect on the mechanical properties of CP Ti compared to its effects on the Ti-6Al-4V alloy. This can be explained in terms of the difference in the solid solution effect of oxygen between the CP Ti and the Ti-6Al-4V alloy. Where, the mechanical properties of Ti-6Al-4V alloy were previously affected by an earlier lattice expansion caused by an increment in the c/a ratio of the Ti-6Al-4V during the Al and V alloying process.

Cu thin films were deposited on Si(100) substrates using direct current (DC) magnetron sputtering. We focused on the effect of sputtering DC power on the electrical, structural properties, and the nucleation and growth of Cu films during the initial stage of sputtering. The Cu films deposited at higher sputtering power showed strong crystallinity, low electrical resistivity in comparison with the Cu films deposited at lower sputtering power. Concerning the nucleation and growth of Cu films during initial stage of magnetron sputtering, it was found that the progress of the nucleation and growth of the Cu films at higher sputtering is much faster than those of the Cu films at lower sputtering power even though they have a similar nucleation and growth mechanism, and their relation to resultant microstructure was confirmed by atomic force microscopy.

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