Guo Yu-hua scite author profile

A &actid aggregation behavior in amorphous silicon nitride (Si,N,) films deposited by microwave electron cyclotron resonance plasma chemical vapor deposition is reported. The fractal structure and dimension of 1.45 obtained by experiment and computer simulation are all in excellent agreement with the result predicted by the cluster-cluster-aggregation model. Theforming of &actid structure is related to the change of discharge mode between ring plasma and bulk plasma.

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Catalytic Activity of M/(MgO)y(CeO2)1－y (M=Ni, Co, Cu) Catalysts for Methane Combustion

Li¹,

Yu-hua²,

Ji³

2005

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Guo Yu-hua

Cerium oxide-modified lithium chromium titanate as high-performance anode material for lithium-ion battery

Fractal Aggregation Behavior in Amorphous Silicon Nitride Films

Catalytic Activity of M/(MgO)<sub>y</sub>(CeO<sub>2</sub>)<sub>1－y</sub> (M=Ni, Co, Cu) Catalysts for Methane Combustion

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