sulated between any two points on the exposed area of two adjacent grids. Therefore, the transferred PPy lines are electrically separated and so might find application in plastic electronics. [19] In summary, we have demonstrated for the first time to our knowledge that electropolymerization on semiconductor substrates patterned with self-assembled films results in patternamplified conducting polymer microstructures. It is a facile and versatile way to directly form positively patterned threedimensional conducting polymer structures, which we believe will find applications in related high-technology fields, such as nano-/microscale electromechanical systems and biosensors.
ExperimentalPatterning was realized making use of the well-established lCP method, using a PDMS stamp to transfer OTS onto freshly cleaned substrate [8]. The substrates used include three types of silicon wafers (n-type (111), 0.015 X cm; n-type (100), 4 X cm; p-type (111), 15 X cm); and ITO (4±7 X cm). Electrodeposition was preformed on a Chi660a (Shanghai Chenhua Apparatus Co. Ltd) electrochemical workstation. A three-electrode system was used, with the patterned substrate as the working electrode, Pt wire as the counter electrode, and Ag/Ag + (10 mM AgNO 3 in acetonitrile) as the reference electrode. The plating solution of acetonitrile contains 0.2 M pyrrole and 0.1 M 1-hexyl-3-methylimidazolium tetrafluoroborate (a gift from Dr. Wang and Dr. Ye of our laboratory) as the supporting electrolyte. To transfer the PPy microstructure, the PPy pattern on the substrate was coated with Sylgard 184 (Dow Corning) and cured at 100 C for 2 h. Then the silicone elastomer was peeled off from the substrate.Resistance measurements were performed making use of a two-probe method. The adhesion strength of the PPy to the silicone elastomer was determined by a peel-off test using a domestic adhesive tape. AFM measurements were taken using an SPM-9500 apparatus (Shimazu). Optical microscopic images were collected on a charge-coupled device (CCD) camera (USA) equipped to a microhardness tester (USA). A variety of synthetic pathways has been proposed for the development of nanostructures because of their numerous potential applications.
Received[1] The use of soft templates [2±4] (chelating agents, surfactants, DNA, etc.) and hard templates [5±11] (anionic alumina, carbon nanotubes, and mesoporous materials) has sparked wonderful contributions. Though various metal and semiconductor nanostructures have successfully been exploited, [2±4] uniform mesostructured crystallized metal oxide patterns are rarely reported, [10n,o,12] probably a result of the difficulty of choosing the proper synthesis precursor and the auxiliary reagents. In this respect, a general synthetic strategy for mesostructured metal oxides guided by ªhost± guest chemistryº is much desired. For the preparation of ordered nanostructure arrays, a hard template has some advantages when compared with a soft template, especially in its specific topological stability, veracity, predictability, and...