A comprehensive study of the error analysis for discrete dipole approximation (DDA) technique applied to simulation of thin film plasmonic solar cell using silver (Ag) and aluminium (Al) nanoparticles has been shown. We have considered a simulation model that gives an estimate of error for sensitive optical properties in nanoplasmonic geometries. The simulations done in the present article establish that the absorption and scattering efficiency calculations are possible with an arbitrary accuracy domain for different materials and sizes. It has been observed that the sufficient discretization of nanostructures in dipoles can restrict the error up to 5 % or less. As a proof of concept, an estimate of error vs. discretization has been calculated for Ag and Al metals in Si3N4 matrix which is also an antireflecting coating used in solar cells. It was accounted that for the particle spherical in shape and of a size of 70 nm discretized with a number of dipoles 10 5 , optimized optical parameters can be calculated accurately in 400-600 for AgSi3N4 spectral range with an error of less than 5.4957 %, and for AlSi3N4, the error is less than 3.8596 %. The results of the current article will be helpful to access the accuracy of efficiency calculations done for subwavelength plasmonic photovoltaic in the near IR region for 20 to 160 nm size.
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