We present a novel bonding process for gallium nitride-based electronic devices on diamond heat spreaders. In the proposed technology, GaN devices are transferred from silicon (Si) onto single (SCD) and polycrystalline diamond (PCD) substrates by van der Waals bonding. Load-pull measurements on Si and SCD heat spreaders at 3 GHz and 50 V drain bias show comparable power-added-efficiency and output power (Pout) levels. A thermal analysis of the hybrids was performed by comparison of 2 × 1mm2AlGaN/GaN Schottky diodes on Si, PCD, and SCD, which exhibit a homogeneous field in the channel in contrast to gated transistors. Significantly different currents are observed due to the temperature dependent mobility in the 2DEG channel. These measurements are supported by a 3D thermal finite element analysis, which suggests a large impact of our transfer technique on the thermal resistance of these devices. In summary, we show a promising new GaN-on-diamond technology for future high-power, microwave GaN device applications.

We present results from GaN-based high voltage transistors used for power switching applications. The static and dynamic properties of transistors on SiC and Si substrates are determined. Overall, this technology is capable to deliver 1000 V breakdown and 95 A output current as well as a lower product of on-resistance and gate charge than conventional Si-based structures. Areas of further improvement in epitaxial growth and device processing are outlined in order to combine these high currents and high voltages in a single device

A high‐voltage AlN/GaN superlattice (SL) buffer for monolithic AlGaN/GaN power circuits is experimentally compared with a step‐graded AlGaN/GaN buffer. The SL as part of a 5.1 μm epitaxial stack withstands over 1.3 kV. Although the step‐graded buffer is sufficient for low‐side circuits, the operation voltage of monolithic topologies such as a half‐bridge is limited: static negative back gating at −200 V depletes the lateral channel completely. Asymmetrical buffer leakage at a positive substrate voltage of +250 V limits the operation voltage further. The SL buffer mitigates both effects: a negative substrate voltage of −200 V reduced the lateral channel current only by 25%. However, this condition is not required for half‐bridge operation on the SL, because low symmetrical vertical buffer leakage at substrate voltages of ±500 V allows operation of power topologies with positive substrate bias. High‐electron‐mobility transistors (HEMTs) on the graded buffer show excessive threshold voltage shift at negative substrate bias. On the SL buffer, the threshold voltage is shifted only +1 V from negative substrate biases, which allows monolithic high‐voltage power topology operation. 98.8% efficient operation of a 6 × 4 mm2 GaN‐on‐Si power integrated circuit with a monolithic half bridge, freewheeling diodes, and drivers is demonstrated on the SL.

Mechanical and electrical properties of Al2O3 films are compared for plasma-assisted atomic layer deposition (ALD) and thermal ALD on two substrates, GaAs and Si, of different thermal expansion coefficient. Films with stable chemical structure and mechanical residual stress could be produced by both techniques without inducing any damage to sensitive multiquantum-well structures. However, the as-deposited residual stress in the plasma ALD Al2O3 films is lower and decreases, while that in the thermal ALD films increases with the deposition temperature. Moreover, the stress hysteresis observed upon thermal cycles is much lower for the plasma ALD films compared to that for the thermal ALD films. The biaxial elastic modulus (BEM or stiffness parameter) increases with the deposition temperature for both ALD films, being higher for the plasma ALD than that for the thermal ALD at a given temperature. The higher BEM is reflected in better electrical properties of the films. Thu s, the leakage current of metal-oxide-semiconductor capacitors with the plasma ALD-Al2O3 film is three orders of magnitude lower and the breakdown voltage 20% higher than that of the capacitors with the thermal ALD film

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