No abstract

This paper addresses challenges and solutions of replacement metal gate of gate-all-around nanosheet devices. The unit process and integration solutions for the metal gate patterning as well as interface dipole patterning to offer multiple threshold voltage have been developed. The challenges of long channel device integration are also discussed.

In advanced semiconductor manufacturing, deep hydrophilic nanoholes are found in various applications, which require a wet clean after patterning. In this work, we use an in-situ ATR-FTIR spectroscopy technique to characterize the wetting of nanoholes in a silica matrix by UPW and electrolyte solutions. Wetting was much slower than predicted by a numerical model, while temperature cycling evidenced the formation of unexpectedly stable gas pockets in the wetted nanoholes. Water structuring in the nanoholes was characterized by an analysis of the OH stretching peak. Besides, monitoring the dissolution of CO2 in the wetted nanoholes allowed to compare the diffusivity in the nano-confined solutions with that in bulk solutions. Our results strongly suggest that the gas pockets were stabilized by the decreased gas diffusivity resulting from water structuring.

In this paper, we discuss the mechanism as well as the methodology of the La2O3 dissolution and its inhibition by functional waters. To clarify the mechanism, the La2O3 etching behavior in the various solutions, the surface state of La2O3 before and after cleaning, and the impact of functional water process on the electrical properties are evaluated. In order to control the La2O3 dissolution, a functional water process with a CO2 dissolved water as well as an ultra-diluted NH4OH have been developed. As a result of this study, it could be concluded that the pH control of the wet solutions plays an important role in terms of controlling the La2O3 dissolution.

This paper focuses on the mechanism and methodology of the dissolution of Alternative Dipole Material (ADM) and its inhibition through the use of functional waters. The study investigates the etching behavior of ADM in different solutions, examines the surface state of ADM before and after cleaning, and evaluates the impact of the functional water process on its electrical properties.