Excellent light−matter interaction and a wide range of thickness-tunable bandgaps in layered vdW materials coupled by the facile fabrication of heterostructures have enabled several avenues for optoelectronic applications. Realization of high photoresponsivity at fast switching speeds is a critical challenge for 2D optoelectronics to enable highperformance photodetection for optical communication. Moving away from conventional type-II heterostructure pn junctions towards a WSe 2 /SnSe 2 type-III configuration, we leverage the steep change in tunneling current along with a light-induced heterointerface band shift to achieve high negative photoresponsivity, while the fast carrier transport under tunneling results in high speed. In addition, the photocurrent can be controllably switched from positive to negative values, with ∼10 4 × enhancement in responsivity, by engineering the band alignment from type-II to type-III using either the drain or the gate bias. This is further reinforced by electric-field dependent interlayer band structure calculations using density functional theory. The high negative responsivity of 2 × 10 4 A/W and fast response time of ∼1 μs coupled with a polarity-tunable photocurrent can lead to the development of next-generation multifunctional optoelectronic devices.

Few layer black phosphorus (BP) has recently emerged as a potential graphene analogue due to its high mobility and direct, appreciable, band gap. The fabrication and characterization of field effect transistors (FETs) involves exposure of the channel material to an electron beam (e-beam) in imaging techniques such as transmission electron microscopy (TEM) and scanning electron microscopy (SEM), and fabrication techniques like electron beam lithography (EBL). Despite this, the effect of e-beam irradiation on BP-FET performance has not been studied experimentally. In this work, we report the first experimental study on the impact of e-beam irradiation on BP-FETs. An electron beam is known to induce defects and structural changes in 2D materials like graphene, MoS2etc. resulting in the deterioration of the device quality. However, for BP-FETs, we observe an improvement in the on-current and carrier mobility (μ) along with a decrease in threshold voltage (Vth) on exposure to an e-beam with 15 keV energy for 80 seconds. These changes can be attributed to the capture of electrons by traps near the SiO2-BP interface and reduced BP surface roughness due to e-beam exposure. Hysteresis measurements and physical characterization (i.e. atomic force microscopy (AFM), X-ray photoelectron (XPS) and Raman spectroscopies) validate these mechanisms. Reduced hysteresis indicates occupation of the traps, AFM surface scans indicate reduced surface roughness and XPS data show a reduced phosphorus oxide (POx) peak immediately after exposure. Raman measurements indicate a probable structural change due to the interaction between e-beam and BP which could result in better stability.

Layered 2D van der Waals semiconductors and their heterostructures have been shown to exhibit positive photoconductance (PPC) in many studies. A few recent reports have demonstrated negative photoconductance (NPC) as well that can enable broadband photodetection besides multi‐level optoelectronic logic and memory. Controllable and reversible switching between PPC and NPC is a key requirement for these applications. This report demonstrates visible‐to‐near infrared wavelength‐driven NPC and PPC, along with reversible switching between the two, in an air stable, high mobility, broadband black phosphorus field effect transistor covered with a few layer MoS2 flake. The crossover switching wavelength can be tuned by varying the MoS2 bandgap through its flake thickness and the NPC and PPC photoresponsivities can be modulated using electrostatic gating as well as laser power. Recombination‐driven NPC and PPC, as supported by density functional theory calculations, allows for reversible switching. Further, gate voltage‐dependent negative persistent photoconductance is well‐suited for optosynaptic applications.

Two-dimensional MoS2 gas sensors have conventionally relied on a change in field-effect-transistor (FET) channel resistance or in the Schottky contact/pn homojunction barrier. We demonstrate an enhancement in sensitivity (6×) and dynamic response along with a reduction in detection limit (8×) and power (104×) in a gate-tunable type-II WSe2(p)/MoS2(n) heterodiode gas sensor over an MoS2 FET on the same flake. Measurements for varying NO2 concentration, gate bias, and MoS2 flake thickness, reinforced with first-principles calculations, indicate dual-mode operation due to (i) a series resistance-based exponential change in the high-bias thermionic current (high sensitivity), and (ii) a heterointerface carrier concentration-based linear change in near-zero-bias interlayer recombination current (low power) resulting in sub-100 μW/cm2 power consumption. Fast and gate-bias tunable recovery enables an all-electrical, room-temperature dynamic operation. Coupled with the sensing of trinitrotoluene (TNT) molecules down to 80 ppb, this study highlights the potential of the WSe2/MoS2 pn heterojunction as a simple, low-overhead, and versatile chemical-sensing platform.

Contactless pick-and-place of millimetric objects using inverted near-field acoustic levitation Applied Physics Letters 116, 054104 (2020);