Three kinds of electro-optic devices composed of the inverted domains in LiNbO3 substrates were fabricated. The devices are induced and controlled by applying an electric field. The three devices are: (i) a cylindrical lens with an aperture of 340 μm and length of 10 mm, which can tune the focusing length from 20 to 50 mm depending on an electric field ranging from 250 to 150 V/mm, (ii) an optical switching device composed of a periodically inverted domain structure, which can reflect the whole power of an incident light beam by applying an electric field of 700 V/mm, and (iii) a deflection device with a deflection angle of about 5°, depending on an electric field of 750 V/mm.

A novel method for optical lithography using a resist with nonlinear photosensitivity and the multiple exposure technique is described. By means of this method, the diffraction-limited optical cutoff frequency is raised markedly, which cannot be realized by any of the other methods proposed previously. A brief explanation of the principle is given and computer simulations are demonstrated.

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A laser scanning differential interference contrast microscope using a differential detection method is proposed. This microscope permits observers to control the differential image contrast with a simple operation. Utilizing this function, the observers are capable of obtaining the optimized differential image whose contrast is most favorable for observation. A simple theoretical analysis and experimental considerations are described.

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