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Thin film material of oriented multiwall carbon nanotubes was obtained by noncatalytical chemical vapor deposition in a glow-discharge plasma. The film phase composition, surface morphology, and structural features were studied by Raman and electron microscopy techniques. Low-voltage electron field emission of thin film nanotube material was obtained and examined in diode configuration. The I-V curves in Fowler-Nordheim coordinates were linear and the corresponding threshold average field was about 1.5 V/m. The emission current density was up to 50 mA/cm 2 at the field of 5 V/m. The emission site density reached 10 7 cm Ϫ2 at the same value of electric field.

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Articles you may be interested inBroad area electron emission from oxygen absorbed homoepitaxially grown nitrogen (N)-doped chemical vapor deposited diamond (111) surface J.Thin film cold cathodes composed of a graphite-type carbon coating on Si substrate have been fabricated and tested. Electrons from the cathodes were emitted into vacuum when the average electric field exceeded 1.5 V/m. The emission current density was more than 1 mA/cm 2 and emission site density was higher than 10 7 cm Ϫ2 at the electric field of 4 V/m. The current-voltage dependencies were studied at different temperatures from 77 to 600 K and found to be typical for the field emission. We propose a mechanism of electron emission from carbon cold cathodes, based on the enhancement of electric field due to surface morphology and on the modification of electronic properties of carbon atoms localized on the surface of graphite-type material.

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